PVD Coating Material

• Nickel Copper (NiCu) Alloy Target

  The preparation process of nickel copper alloy target is melting the metal raw materials into alloy ingots, and then plastically form the ingots through the forming process to meet customers’...

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• Nickel Iron (NiFe) Sputtering Target

  The melting point of Nickel-iron NiFe is 1430-1480 degrees and the density is between 8.1-8.7g/cm3. Nickel-iron alloy is a low-frequency soft magnetic material with low coercivity and high...

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• Nickel Vanadium (NiV) Sputtering Target

  High-purity nickel-vanadium alloy target has silver-white metallic luster, density: 6.11g/cm3, melting point is 1910°C, boiling point is 3407°C. It is one of the most important thin-film...

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• Cobalt Chromium (CoCr) Alloy Target

  Cobalt chromium (CoCr) alloy target is a silvery white color, which is an alloy with cobalt and chromium as the main components. Since 1929, it has been used as a dental restoration material, and...

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• Cobalt Iron (CoFe) Alloy Target

  Our Cobalt Iron (CoFe) Alloy targets are mainly used to prepare magnetic films for various purposes through the physical vapor deposition (PVD) process. The targets are composed of cobalt-iron...

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• Cobalt Iron Boron (CoFeB) Alloy Target

  The emergence of thin film CoFeB has driven research and industrial applications in the past decades, with the magnetic random access memory (MRAM) the most prominent example. Because of its...

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• Cobalt Tantalum Zirconium (CoTaZr) Alloy Target

  Cobalt Tantalum Zirconium (CoTaZr) Alloy Target is produced by melting technology, it's usually applied for magnetic data storage field. With up to 3N5 purity, uniform grain size, lower oxygen...

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• Cerium Gadolinium (CeGd) alloy Target

  Cerium Gadolinium Alloy Sputtering Target (CeGd) is a key material in thin-film deposition. This alloy, combining cerium and gadolinium, offers unique properties for coating applications. CeGd...

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• Beryllium Sputtering Target

  Our beryllium(Be) sputtering targets are made of high purity beryllium material, which is a silvery-white metal, relatively soft and has a low density.

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• Chromium Sputtering Target

  Chromium sputtering target has the same properties as metal chromium (Cr), Chromium is a chemical element with the symbol Cr and atomic number 24, it is a steely-grey, lustrous, hard and brittle...

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• Ruthenium Sputtering Target

  Ruthenium sputtering targets are used for depositing Ru thin film, which is a important intermediate film in the structure of perpendicular magnetic recording multi-layer films.

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• Scandium Sputtering Target

  Scandium is a chemical element with symbol Sc and atomic number 21, It is a soft, silver-white transition metal with a melting point of 1541℃ and a boiling point of 2831℃. Easy to dissolve in...

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