Description Of Ta 5at% Doped ZrC Sputtering Target
The 5 at% Tantalum-Doped Zirconium Carbide Sputtering Target is a high-performance ceramic sputtering target material, consisting of a zirconium carbide (ZrC) matrix doped with 5 atomic percent (at%) of tantalum (Ta). This material combines the exceptional properties of both zirconium carbide and tantalum; through doping modification, its overall performance is further enhanced, making it suitable for physical vapor deposition (PVD) processes-such as magnetron sputtering-for the fabrication of thin-film coatings with specific functional attributes. The target material is primarily composed of zirconium carbide, a ceramic material characterized by its high melting point and high hardness. Tantalum, a high-melting-point metal, has a well-established history of high-purity target preparation technology, particularly in fields such as semiconductor manufacturing. The incorporation of 5 at% tantalum into the zirconium carbide crystal structure is designed to optimize the material's physicochemical properties-either through the formation of solid solutions or composite phases-thereby achieving objectives such as improved electrical conductivity, enhanced high-temperature stability, or the precise tuning of the mechanical and electrical characteristics of the resulting thin films.
Features Of Ta 5at% Doped ZrC Sputtering Target
Exceptional Thermal Stability: Zirconium carbide itself possesses a high melting point, while tantalum carbide (TaC) boasts an even higher melting point-reaching up to 3880°C-demonstrating remarkable chemical stability under extreme temperatures. Doping with tantalum holds the potential to further enhance the material's overall thermal stability and resistance to high-temperature oxidation.
Superior Hardness and Wear Resistance: Both zirconium carbide and tantalum carbide exhibit extremely high hardness (tantalum carbide has a Mohs hardness approaching 9). Consequently, thin-film coatings fabricated from these materials possess outstanding wear resistance, making them ideal for surface protection applications requiring high durability.
Excellent Chemical Inertness: Tantalum carbide demonstrates exceptional corrosion resistance in environments involving strong acids, strong bases, and oxidizing agents. Doping with tantalum may further bolster the protective capabilities of the thin films deposited from the zirconium carbide target material when exposed to harsh chemical environments.
Electrical Conductivity and Functional Tunability: Zirconium carbide possesses inherent electrical conductivity. Doping with metallic tantalum (which is itself an excellent conductor) can significantly improve the electrical conductivity of both the target material and the deposited thin films; this is crucial for fabricating films that require a combination of wear resistance and electrical conductivity. By precisely controlling the tantalum doping ratio (e.g., at 5 at%), parameters such as the film's resistivity and mechanical strength can be finely tuned to meet the specific requirements of various applications.
Applications Of Ta 5at% Doped ZrC Sputtering Target
Wear-Resistant and Protective Coatings: Applied to the surfaces of cutting tools, molds, and critical mechanical components to significantly extend their service life and reduce wear.
Protection in High-Temperature and Corrosive Environments: Applied to the surfaces of aerospace engine components, nuclear reactor assemblies, and chemical processing equipment (such as pump casings and pipelines) to protect against high temperatures, oxidation, and corrosion.
Functional Thin Films and Electronics: Its enhanced electrical conductivity opens up possibilities for its use in the fabrication of specialized resistive films, diffusion barrier layers, or certain optoelectronic components. While the technology utilizing high-purity tantalum targets as barrier layer materials in semiconductor copper interconnects is already well-established, tantalum-doped zirconium carbide films may offer an alternative solution for similar-or even more demanding-microelectronic applications.
Other Specialized Applications: Employed in magnetron sputtering processes for the fabrication of high-performance zirconium-based thin films; when doped, the properties of these films can be further extended to applications in functional devices such as optical coatings and sensors.
Specifications Of Ta 5at% Doped ZrC Sputtering Target
Purity: 99.5%
Form: Disc, Plate, Column, Stepped, Planar, Rotatory, or Customized
Diameter: 20~205mm / Dia. 1"~8",
Thick 3.175mm, 6.35mm / 0.125" and 0.25"
Other: Indium Bonding
Quality Control and Testing Of Ta 5at% Doped ZrC Sputtering Target
FAQ For Ta 5at% Doped ZrC Sputtering Target
Are you a factory or a manufacturer?
A: Yes, we are a Ta 5at% Doped ZrC Sputtering Target factory, but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.
What is the delivery method?
A: Generally, we send Ta 5at% Doped ZrC Sputtering Target by UPS, DHL, or FedEx. Also, we can send by sea to a seaport or by air to the closest airport.
Why is your Ta 5at% Doped ZrC Sputtering Target so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process, and we obtain raw material directly from its source.
Do you do spot quality inspection of products?
A: 100% full inspection for sure. All unqualified Ta 5at% Doped ZrC Sputtering Targets are discarded.
How do you ensure your lead time?
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.
What is the MOQ of Ta 5at% Doped ZrC Sputtering Target?
A: Depends on the quantity of Ta 5at% Doped ZrC Sputtering Target; generally, no MOQ limit.
How to pay for the products?
A: A bank transfer (T/T) will be acceptable.
What is the delivery time?
A: Around 7-20 days, which depends on the quantity and production of Ta 5at% Doped ZrC Sputtering Target.
What kind of package is it?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the safety of Ta 5at% Doped ZrC Sputtering Target.
What is the lead time?
A: From the order placed to cargo receiving will take around 10-25 days.
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