Description Of 4N IGZO Sputtering Target
IGZO sputtering targets, also known as Indium Gallium Zinc Oxide sputtering targets, are multicomponent composite oxide ceramic targets formed by mixing and sintering indium oxide (In₂O₃), gallium oxide (Ga₂O₃), and zinc oxide (ZnO) in specific proportions. They serve as the core source material in physical vapor deposition (PVD) processes, such as magnetron sputtering, and are utilized to fabricate high-performance IGZO thin films-specifically as the active layer material for thin-film transistors (TFTs).
Features Of 4N IGZO Sputtering Target
High Electron Mobility: Its carrier mobility far exceeds that of traditional amorphous silicon materials-reaching 10 times, or even 20 to 30 times, that of amorphous silicon-which directly enhances the switching response speed and overall performance of TFTs.
Low Leakage Current and Low Power Consumption: IGZO thin films exhibit excellent switching characteristics, featuring extremely low current in the off-state; this contributes significantly to reducing the power consumption of display panels and electronic devices.
Excellent Optical Transparency: It demonstrates high transmittance within the visible light spectrum, thereby meeting the material requirements for transparent electrodes or active layers in high-brightness and high-image-quality display applications.
High Stability and Uniformity: Through the optimization of fabrication processes, sputtering targets with high density, stable composition, and minimal defects can be achieved, thereby ensuring consistent thin-film quality and meeting the demands of large-scale mass production.
Low-Temperature Process Compatibility: High-quality thin films can be deposited at relatively low substrate temperatures; this capability is crucial for flexible display substrates (such as plastics), as it prevents the damage to flexible substrates that would otherwise be caused by high-temperature processing.
Applications Of 4N IGZO Sputtering Target
High-End Flat Panel Displays: Serving as a core material for fabricating high-performance TFT backplanes, this technology is widely utilized in Liquid Crystal Displays (LCDs), Organic Light-Emitting Diode (OLED) displays, and Micro-LED displays that demand Ultra-High Definition (4K/8K) resolution, high refresh rates, and low power consumption. Display panels based on IGZO TFT technology have been adopted by numerous renowned brands for products such as laptops and tablets.
Flexible and Printed Displays: Its low-temperature film-forming characteristics make it an ideal choice for bendable and foldable display devices-such as flexible OLEDs and electronic paper-thereby providing a technological foundation for wearable devices.
Emerging Semiconductor Applications: It demonstrates immense potential in the field of sensing (e.g., photodetectors and pressure sensors), data storage (e.g., serving as channel material for memristors in neuromorphic computing), and transparent electronic devices.
Specifications Of 4N IGZO Sputtering Target
Typical Composition: In:Ga:Zn= 1:1:1:4 (atomic ratio); other compositions available
Purity: 4N+ (99.99% and higher)
Form: Planar; Rotary
Color: Bright grey
Shape: Discs, Plates, Column Targets, Custom-made
Typical Density: ≥6.30 g/cm³
Typical Dimension: - Planar: L300-1100mm for single segment/- Rotary: L300-700mm for single segment/Other dimensions available
Quality Control and Testing Of 4N IGZO Sputtering Target
FAQ For 4N IGZO Sputtering Target
Are you a factory or a manufacturer?
A: Yes, we are a 4N IGZO Sputtering Target factory, but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.
What is the delivery method?
A: Generally, we send 4N IGZO Sputtering Target by UPS, DHL, or FedEx. Also, we can send by sea to a seaport or by air to the closest airport.
Why is your 4N IGZO Sputtering Target so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process, and we obtain raw material directly from its source.
Do you do spot quality inspection of products?
A: 100% full inspection for sure. All unqualified 4N IGZO Sputtering Targets are discarded.
How do you ensure your lead time?
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.
What is the MOQ of 4N IGZO Sputtering Target?
A: Depends on the quantity of 4N IGZO Sputtering Target; generally, no MOQ limit.
How to pay for the products?
A: A bank transfer (T/T) will be acceptable.
What is the delivery time?
A: Around 7-20 days, which depends on the quantity and production of the 4N IGZO Sputtering Target.
What kind of package is it?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the safety of the 4N IGZO Sputtering Target.
What is the lead time?
A: From the order placed to cargo receiving will take around 10-25 days.
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