Products Description
Yttrium oxide target is a material made of high-purity yttrium oxide (Y₂O₃) powder pressed and sintered. It has high melting point, high density, excellent chemical stability and good optical properties. Therefore, it is widely used in electronics, optics, coatings and ceramics.
Compared with other oxide targets, our yttrium oxide targets have three irreplaceable features: First, stability in extreme environments, because yttrium oxide is 5 times more resistant to plasma erosion than Al₂O₃ (CF₄/O₂ plasma), and does not decompose below 2000°C (Al₂O₃ begins to volatilize at 1800°C). Second, the optical properties of yttrium oxide targets, with wide-band transparency (0.3-8μm) and a refractive index of 1.92@4μm (suitable for infrared anti-reflection film). Thirdly, the ultra-high purity of yttrium oxide targets. The purity of yttrium oxide targets produced by our company can reach 99.999% (semiconductor grade), and metal impurities <1ppm (Na/K/Ca, etc.)
Features of Yttrium Oxide (Y2O3) Sputtering Target
High melting point: Yttrium oxide has a very high melting point of about 2410°C.
Good chemical stability: It can remain stable in a variety of environments and is not easy to react with other substances.
High density: The high density of yttrium oxide helps to improve sputtering efficiency and film density.
Specification of Yttrium Oxide (Y2O3) Sputtering Target
| Material | Y2O3 sputtering target |
| Purity | 99.99% |
| Denisty | 5.01g/cm3 |
| Color | White |
| Size | Customized |
| Packing: | Vacuum sealed package inside; Wooden case outside |
| Production Method | hot press sintering; |
| Type of Bonding | Indium, Elastomer; |
Core Application of Yttrium Oxide (Y2O3) Sputtering Target
Semiconductor equipment:
Plasma etching chamber lining
Halogen plasma corrosion resistance:
- CF₄ plasma erosion rate <0.1nm/min
- 5 times longer life than Al₂O₃
- Wafer transfer robot arm coating
Optical coating:
Infrared window anti-reflection film (3-5μm band)
- Refractive index 1.92@4μm
- Laser damage threshold >5J/cm² (1064nm, 10ns)
EUV lithography mirror protection layer
Functional coating:
Nuclear reactor neutron absorption coating (Y-89 isotope)
High temperature sensor insulation layer (1800℃ long-term stability)
FAQ
Are you a factory or manufacturer?
A: Yes, we are a factory but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.
What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.
Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process. We obtain our raw material directly from its source.
Do you do spot quality inspection or full inspection?
A: 100% full inspection. Inspectors will check the finished product individually, to ensure they adhere to all parameters. All unqualified products are discarded.
How do you ensure your lead time?
A: From material preparation to machining, and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.
What is the MOQ of Yttrium Oxide (Y2O3) Sputtering Target?
A: Depends on quantity, generally, no MOQ limit.
How to pay for it?
A: A bank transfer (T/T) will be acceptable.
What is the delivery time?
A: around 7-20 days which depends on the quantity and production.
What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo
What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.
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