Metal Supttering Targets

• Customizable 4N Carbon Sputtering Target

  Our high-purity 4N carbon sputtering targets are fabricated from 99.99% pure carbon material, featuring low impurity levels and making them ideal for applications in semiconductors, optical thin...

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• Custom Boron Sputtering Targets

  We provide high-purity, dense boron targets perfectly suited for semiconductor and coating processes. We support custom fabrication based on technical drawings, strictly controlling impurity...

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• Customized 3N5 Round Tungsten Target

  We offer custom-made circular tungsten targets with 3N5 purity (99.95%). Manufactured using powder metallurgy, they feature a uniform microstructure, high density, and are free of porosity and...

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• Customized High Purity Hf Sputtering Target

  We offer custom-made high-purity hafnium sputtering targets with a purity exceeding 99.9%, featuring uniform density and fine microstructure. Specifically designed for semiconductor chips, optical...

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• Customized 3N5 Hafnium Rod

  3N5 high-purity hafnium rods, 99.95% purity, nuclear-grade quality! Resistant to ultra-high temperatures and strong corrosion, the first choice for nuclear reactors, aerospace engines, and...

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• Customized 3N Tin Target

  High-purity 3N tin sputtering target + custom copper backplate doubles sputtering efficiency! Seamless bonding prevents detachment, resulting in uniform, impurity-free films – the top choice for...

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• Customizable 3N5 Rectangular Hafnium Target

  3N5 high-purity hafnium target, 99.95% purity, custom rectangular dimensions accurate to the micrometer! The first choice for semiconductor coating and optical coating, producing a dense,...

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• 4N Mg Magnesium Sputtering Target

  4N magnesium sputtering targets are high-purity metal sputtering materials with a purity of ≥99.99%. They feature fine grains and uniform composition, making them suitable for semiconductor,...

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• 99.95% Hf Hafnium Sputtering Target

  99.95% high-purity hafnium sputtering target, aerospace-grade Hf metal target, custom size, bonded copper backing plate, used for semiconductor thin films, optical coatings, military coatings,...

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• Zirconium Tube Target

  Zirconium tube targets are thin-walled, high-purity zirconium tubes that are corrosion-resistant and high-temperature resistant, producing a dense, uniform film during sputtering. They are widely...

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• Beryllium Sputtering Target

  Our beryllium(Be) sputtering targets are made of high purity beryllium material, which is a silvery-white metal, relatively soft and has a low density.

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• Chromium Sputtering Target

  Chromium sputtering target has the same properties as metal chromium (Cr), Chromium is a chemical element with the symbol Cr and atomic number 24, it is a steely-grey, lustrous, hard and brittle...

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