Customized High Purity Hf Sputtering Target
Customized High Purity Hf Sputtering Target

Customized High Purity Hf Sputtering Target

We offer custom-made high-purity hafnium sputtering targets with a purity exceeding 99.9%, featuring uniform density and fine microstructure. Specifically designed for semiconductor chips, optical coatings, and aerospace applications, they ensure denser coatings and superior conductivity. Customization to drawing dimensions is supported, with rapid delivery times, facilitating your cutting-edge R&D and mass production.
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Description Of Customized High Purity Hf Sputtering Target

 

High-purity hafnium sputtering targets are key fundamental materials in semiconductor manufacturing, optical coating, and aerospace industries. Their core value lies in their extremely high material purity (typically reaching 99.95% or higher) and excellent physicochemical stability, which ensures the formation of uniform, high-performance thin films during sputtering deposition. The impurity content is extremely low (e.g., zirconium content can be less than 0.5%), which underpins the guarantee of the thin films' electrical performance and reliability.

 

Applications Of Customized High Purity Hf Sputtering Target

 

Semiconductor Manufacturing: Used in physical vapor deposition (PVD), particularly for manufacturing high-k insulating films for transistor gates, an indispensable material for advanced chip manufacturing processes.

Optical Coatings: Used to prepare thin films for optical components such as mirrors and lenses; their high purity ensures excellent optical performance.

Aerospace and New Energy: Used for high-temperature protective coatings or functional films on engine components, turbine blades, etc., improving the surface hardness and lifespan of components.

 

Specifications Of Customized High Purity Hf Sputtering Target

 

Material  ≥3N Hf
Theoretical Density (g/cc) 13.31
Z Ratio 0.36
Sputter DC
Purity 99.9%(Zr≤0.5wt%)
Size Dia. 1inche - 8inches
Type of Bond Indium, Elastomer

 

Quality Control and Testing Of Customized High Purity Hf Sputtering Target

 

1QC

 

FAQ for Customized High Purity Hf Sputtering Target

 

Are you a factory or a manufacturer?
A: Yes, we are a Customized High Purity Hf Sputtering Target factory, but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.

What is the delivery method?
A: Generally, we send Customized High Purity Hf Sputtering Target by UPS, DHL, or FedEx. We can also send by sea to a seaport or by air to the nearest airport.

Why is your Customized High Purity Hf Sputtering Target so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process, and we obtain raw material directly from its source.

Do you do spot quality inspection of products?
A: 100% full inspection for sure. All unqualified Customized High Purity Hf Sputtering Targets are discarded.

How do you ensure your lead time?
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.

What is the MOQ of Customized High Purity Hf Sputtering Target?
A: Depends on the quantity of Customized High Purity Hf Sputtering Target; generally, no MOQ limit.

How to pay for the products?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time​​​​?
A: Around 7-20 days, which depends on the quantity and production of Customized High Purity Hf Sputtering Target.

What kind of package is it?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the safety of the Customized High Purity Hf Sputtering Target.

What is the lead time​​​​?
A: From the order placed to cargo receiving will take around 10-25 days.

 

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