PVD Coating Material

  • 4N Mg Magnesium Sputtering Target
    4N magnesium sputtering targets are high-purity metal sputtering materials with a purity of ≥99.99%. They feature fine grains and uniform composition, making them suitable for semiconductor,...
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  • 99.95% Hf Hafnium Sputtering Target
    99.95% high-purity hafnium sputtering target, aerospace-grade Hf metal target, custom size, bonded copper backing plate, used for semiconductor thin films, optical coatings, military coatings,...
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  • Zirconium Tube Target
    Zirconium tube targets are thin-walled, high-purity zirconium tubes that are corrosion-resistant and high-temperature resistant, producing a dense, uniform film during sputtering. They are widely...
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  • ZrTi Sputtering Target
    ZrTi Sputtering Target are mainly used in electronic information industry, glass coating field, high temperature corrosion resistant materials, high-end decorative products, touch screen industry...
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  • ZrTi Sputter Targets
    ZrTi Sputter Targets are one of the commonly used metal sputtering targets, which can be divided into planar targets, sprayed targets and rotating targets, etc., and play an important role in the...
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  • Zirconium Titanium ZrTi Sputtering Target
    Zirconium Titanium ZrTi Sputtering Target are widely used in multi-arc ion vacuum coating or magnetron sputtering PVD in industry, and can be used as wear-resistant materials, decorative coatings...
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  • Titanium Silicon Sputtering Target
    Titanium Silicon Sputtering Target have the characteristics of high mechanical strength, good wear resistance, strong corrosion resistance and good impact resistance, suitable for automotive glass...
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  • Cr-Ti Alloy Sputtering Target
    High-quality thin-film coatings sputtered by Cr-Ti Alloy Sputtering Target are not only used as decorative coatings for watches, electronics, control components and many other products to impart...
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  • Chromium Titanium Sputtering Target
    Titanium chromium alloys are often used in the industrial field, mainly for the production of condensers in power stations, compressor parts for engines, electrodes in the electrolysis industry,...
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  • Chromium Titanium Alloy Sputtering Target
    Chromium Titanium Alloy Sputtering Target has the characteristics of strong impact resistance, high corrosion resistance, high coating quality, long service life and excellent conductivity. All of...
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  • Boron Nitride (BN) Crucible
    Boron Nitride (BN) Crucible is widely used in practical applications, primarily in metal smelting, semiconductor crystal growth, ceramic and glass manufacturing, chemical processing, as well as in...
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  • Niobium (Nb) Crucible
    Niobium crucibles are essential in several high-tech industries due to their superior heat resistance and chemical inertness. Commonly used in the field of materials science, they are pivotal for...
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