PVD Coating Material
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![Bismuth Sputtering Target]()
Bismuth Sputtering TargetBismuth sputtering target is made of bismuth element, which is commonly used in magnetron sputtering, electron beam coating and other processes. Bismuth is a chemical element with the symbol Bi...read more -
![Aluminum Sputtering Target]()
Aluminum Sputtering TargetAluminum sputtering targets are of high purity, typically 99.99% or higher. Aluminum has a melting point of 660°C and a thermal conductivity of 235 W/m·K, properties that make it excellent in...read more -
![Tantalum Sputtering Target]()
Tantalum Sputtering TargetElement Symbol:Taread more
Purity:3N5, 4N, 4N5, 5N
Shape:Planar target, Rotary target
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