PVD Coating Material

• Hafnium Oxide (HfO2) Sputtering Target

  Zirconia (ZrO2), also known as zirconium dioxide, is a very important high-performance ceramic material. Due to its high melting point, high flexural strength and chemical stability, it is widely...

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• Indium Oxide (In2O3) Sputtering Target

  Indium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications.

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• Indium Tin Oxide (ITO) Sputtering Target

  ITO target material is important. It’s a transparent conductive material. ITO targets are used a lot in making thin films for electronic and optoelectronic devices. ITO can conduct electricity...

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• Silicon Oxide (SiO2) Sputtering Target

  Silicon dioxide, as a widely used material in modern technology, has received widespread attention due to its excellent physical and chemical properties. Especially in magnetron sputtering...

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• Indium Gallium Zinc Oxide (IGZO) Sputtering Target

  We process Indium Gallium Zinc Oxide (IGZO) Sputtering Targets with high quality at competitive price. IGZO sputtering target, whose full name is indium gallium zinc oxide target, which contains...

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• Silicon Nitride (Si3N4) Sputtering Target

  Our silicon nitride sputtering target is a high-purity ceramic material used in physical vapor deposition (PVD) process, usually provided in the form of dense discs or rectangular blocks.

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• Lithium Manganate (LiMn2O4) Sputtering Target

  Lithium manganate sputtering target is a black sputtering material with the element Li, Mn and O. It is a conductive ceramic solid electrolyte material for lithium-ion batteries.

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• Lithium Cobaltate (LiCoO2) Sputtering Target

  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.

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• Yttrium Oxide (Y2O3) Sputtering Target

  Purity: 99.99%;
  Production Method: hot press sintering;
  Available dimensions:
  

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• Zirconium Oxide (ZrO2) Sputtering Target

  We produce and supply full range of ceramic sputtering targets and compound targets, including oxide sputtering targets, carbide sputtering targets, fluoride sputtering targets, sulfide sputtering...

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• Lithium Nniobate (LiNbO3) Sputtering Target

  Our factory can produce and supply full range of ceramic sputtering targets and compound targets, including oxide sputtering targets, carbide sputtering targets, fluoride sputtering targets,...

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• Zinc Oxide/Aluminum Oxide (AZO-ZnO/Al2O3) Sputtering Target

  Our factory producing high purity Aluminum-doped Zinc Oxide (AZO) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical...

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