PVD Coating Material

• Customized 3N5 Hafnium Rod

  3N5 high-purity hafnium rods, 99.95% purity, nuclear-grade quality! Resistant to ultra-high temperatures and strong corrosion, the first choice for nuclear reactors, aerospace engines, and...

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• 4N Carbon Target With Copper Backplate

  4N high-purity carbon sputtering target with copper backplate, 99.99% purity, ensures more stable sputtering! The copper backplate provides fast thermal conductivity and strong heat dissipation,...

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• Customized 3N Tin Target

  High-purity 3N tin sputtering target + custom copper backplate doubles sputtering efficiency! Seamless bonding prevents detachment, resulting in uniform, impurity-free films – the top choice for...

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• Customized HfC Particles

  Description Of Customized HfC Particles HfC particles are typically synthesized by reacting hafnium dioxide (HfO₂) with carbon at high temperatures (1900–2300℃) in an inert or reducing...

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• Customizable 3N5 Rectangular Hafnium Target

  3N5 high-purity hafnium target, 99.95% purity, custom rectangular dimensions accurate to the micrometer! The first choice for semiconductor coating and optical coating, producing a dense,...

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• 3N Pb1.1(Zr0.51Ti0.48Mn0.01)O3 Target

  Description Of 3N Pb1.1(Zr0.51Ti0.48Mn0.01)O3 Target Pb1.1(Zr0.51Ti0.48Mn0.01)O3 is a specially doped lead zirconate titanate (PZT)-based sputtering target. Its core chemical formula is...

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• 4N Mg Magnesium Sputtering Target

  4N magnesium sputtering targets are high-purity metal sputtering materials with a purity of ≥99.99%. They feature fine grains and uniform composition, making them suitable for semiconductor,...

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• 99.95% Hf Hafnium Sputtering Target

  99.95% high-purity hafnium sputtering target, aerospace-grade Hf metal target, custom size, bonded copper backing plate, used for semiconductor thin films, optical coatings, military coatings,...

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• Zirconium Tube Target

  Zirconium tube targets are thin-walled, high-purity zirconium tubes that are corrosion-resistant and high-temperature resistant, producing a dense, uniform film during sputtering. They are widely...

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• ZrTi Sputtering Target

  ZrTi Sputtering Target are mainly used in electronic information industry, glass coating field, high temperature corrosion resistant materials, high-end decorative products, touch screen industry...

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• ZrTi Sputter Targets

  ZrTi Sputter Targets are one of the commonly used metal sputtering targets, which can be divided into planar targets, sprayed targets and rotating targets, etc., and play an important role in the...

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• Zirconium Titanium ZrTi Sputtering Target

  Zirconium Titanium ZrTi Sputtering Target are widely used in multi-arc ion vacuum coating or magnetron sputtering PVD in industry, and can be used as wear-resistant materials, decorative coatings...

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