PVD Coating Material
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Zirconium Oxide (ZrO2) GranulesZirconium oxide (ZrO₂) granules are widely used in many fields due to their excellent properties. They provide high-performance material support for industrial manufacturing, electronics,...read more
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Silico (Si) GranulesnSilicon exists in two allotropic forms; brown silicon is a powder, whereas crystalline (metallic) silicon is grey and it is the latter which is more widely used. Bulk silicon is unreactive towards...read more
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Vanadium (V) PelletsVanadium (V) is a hard, silvery gray, malleable transition metal with a natural resistance to corrosion. Due to vanadium's ability to form strong steel alloys, it is a common component used in...read more
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Titanium (Ti) PelletsTitanium's versatility extends across numerous products, from watches and drill bits to laptops and bicycles. In its pure form, it shines with a silvery-white lustrous finish and is easily...read more
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Tin (Sn) PelletsTin (Sn) pellets are used a lot in electronics. They help solder circuit boards. They also coat semiconductors. In metalworking, tin pellets make alloys like bronze. They are used in battery...read more
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Aluminium Oxide (Al2O3) GranulesAluminium Oxide (Al2O3) Granules serve a major role in grinding and polishing, refractory and ceramic material production, and are also used as catalyst supports in electronic components and...read more
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Hafnium Oxide (HfO2) Sputtering TargetZirconia (ZrO2), also known as zirconium dioxide, is a very important high-performance ceramic material. Due to its high melting point, high flexural strength and chemical stability, it is widely...read more
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Indium Oxide (In2O3) Sputtering TargetIndium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications.read more
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Indium Tin Oxide (ITO) Sputtering TargetITO target material is important. It’s a transparent conductive material. ITO targets are used a lot in making thin films for electronic and optoelectronic devices. ITO can conduct electricity...read more
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Silicon Oxide (SiO2) Sputtering TargetSilicon dioxide, as a widely used material in modern technology, has received widespread attention due to its excellent physical and chemical properties. Especially in magnetron sputtering...read more
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Indium Gallium Zinc Oxide (IGZO) Sputtering TargetWe process Indium Gallium Zinc Oxide (IGZO) Sputtering Targets with high quality at competitive price. IGZO sputtering target, whose full name is indium gallium zinc oxide target, which contains...read more
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Silicon Nitride (Si3N4) Sputtering TargetOur silicon nitride sputtering target is a high-purity ceramic material used in physical vapor deposition (PVD) process, usually provided in the form of dense discs or rectangular blocks.read more
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