Alloy Sputtering Targets

• ZrTi Sputtering Target

  ZrTi Sputtering Target are mainly used in electronic information industry, glass coating field, high temperature corrosion resistant materials, high-end decorative products, touch screen industry...

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• ZrTi Sputter Targets

  ZrTi Sputter Targets are one of the commonly used metal sputtering targets, which can be divided into planar targets, sprayed targets and rotating targets, etc., and play an important role in the...

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• Zirconium Titanium ZrTi Sputtering Target

  Zirconium Titanium ZrTi Sputtering Target are widely used in multi-arc ion vacuum coating or magnetron sputtering PVD in industry, and can be used as wear-resistant materials, decorative coatings...

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• Titanium Silicon Sputtering Target

  Titanium Silicon Sputtering Target have the characteristics of high mechanical strength, good wear resistance, strong corrosion resistance and good impact resistance, suitable for automotive glass...

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• Cr-Ti Alloy Sputtering Target

  High-quality thin-film coatings sputtered by Cr-Ti Alloy Sputtering Target are not only used as decorative coatings for watches, electronics, control components and many other products to impart...

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• Chromium Titanium Sputtering Target

  Titanium chromium alloys are often used in the industrial field, mainly for the production of condensers in power stations, compressor parts for engines, electrodes in the electrolysis industry,...

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• Chromium Titanium Alloy Sputtering Target

  Chromium Titanium Alloy Sputtering Target has the characteristics of strong impact resistance, high corrosion resistance, high coating quality, long service life and excellent conductivity. All of...

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• Tungsten Titanium (WTi) Sputtering Target

  Tungsten Titanium Sputtering Targets are produced by powder metallurgy technology which are widely used for semiconductor and thin film solar cells. Our factory can produce WTi 90/10wt%, WTi...

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• Aluminium Neodymium (AlNd) Sputtering Target

  Aluminum neodymium alloy is a commonly used magnetron sputtering target. Aluminum has a melting point of 660℃, density of 2.7, and thermal conductivity of 0.53, while neodymium has a melting point...

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• Aluminium Copper (AlCu) Sputtering Target

  Aluminum Copper sputtering target is perfect for a number of industries and applications, due to its high hardness, tensile strength and light weight. It has usually 1-3% copper content and has...

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• Aluminium Scandium (AlSc) Sputtering Target

  Scandium has a good dispersion strengthening effect on aluminum. It is a stable non-recrystallization structure during hot working or annealing state. Some alloys are cold rolled plates, which...

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• Aluminium Silicon (AlSi) Sputtering Target

  The targets are prepared by blending Aluminum and Silicon powders followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired...

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