Aluminium Copper (AlCu) Sputtering Target
Aluminium Copper (AlCu) Sputtering Target

Aluminium Copper (AlCu) Sputtering Target

Aluminum Copper sputtering target is perfect for a number of industries and applications, due to its high hardness, tensile strength and light weight. It has usually 1-3% copper content and has the similar chemical properties with Aluminum.
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Products Description

 

Our aluminum copper sputtering target has high hardness, tensile strength and light weight, It is perfect for a number of industries and applications. It has usually 1-3% copper content and has the similar chemical properties with aluminum.

 

Aluminum copper sputtering target is usually silvery white and has a metallic luster.They are widely used in semiconductor integrated circuits (VLSI), optical discs, flat panel displays, and workpiece surface coatings. In addition, aluminum copper alloys are widely used in seawater cooling systems, papermaking, printing and textile industries, food industries, heat exchangers, automotive industries, and seawater pipeline systems in desalination plants due to their excellent corrosion resistance.

 

Besides, AlCu has high mechanical properties, excellent machinability, and high-temperature suitability, so it could be the suitable material for high performance Aluminum alloy.

 

High purity AlCu alloy sputtering target could be used in a broad range of industrial fields from semiconductor and electronic functional components. With 5N high purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

 

product-985-852

 

Specification of Aluminium Copper (AlCu) Sputtering Target

Category

Alloy Sputtering Target

Chemical Formula

AlCu

Composition

Aluminum Copper

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤200mm,W≤200mm

 

process of Aluminium Copper (AlCu) Sputtering Target

 

 

  • Smelting and casting method

Vacuum induction melting (VIM) to prevent oxidation
Rapid cooling (>100℃/s) to avoid Cu segregation
Typical process flow:
Batching→vacuum melting→quench casting→homogenization annealing→hot rolling→finishing

 

 

  • Powder metallurgy method

Applicable to nanostructured targets
Process route:
Gas atomization powder making→screening→cold isostatic pressing→vacuum sintering→hot isostatic pressing (HIP)

 

  • Processing requirements

Surface roughness: Ra≤0.4μm
Dimension tolerance: ±0.05mm (target below Φ200mm)
Binding method: ultrasonic welding (copper back plate) or brazing

 

 

Core applications of Aluminium Copper (AlCu) Sputtering Target

 

  • Semiconductor field

Interconnect wire (replacing pure Al):

0.5-1% Cu can inhibit electromigration

Key materials for processes below 90nm

Diffusion barrier: AlCu/TiN laminated structure

 

  • Optical coating

Infrared reflector (AlCu/Ag multilayer film)

Solar selective absorption film

 

  1. Mechanical engineering

Tool wear-resistant coating (AlCuN composite film)

Bearing surface reinforcement

 

Performance Comparison (with Different Cu Content)

 

 

Characteristic Al-0.5%Cu Al-2%Cu Al-4%Cu
Resistivity 3.1 μΩ·cm 3.3 μΩ·cm 3.8 μΩ·cm
Hardness 1.2 GPa 1.5 GPa 2.1 GPa
Deposition Rate 120 nm/min 110 nm/min 95 nm/min
Electromigration Lifetime 10× Pure Al 15× Pure Al 8× Pure Al

 

 

 

Selection recommendations


Semiconductor grade: Al-0.5%Cu (4N5 purity)
Tool coating: Al-4%Cu+reactive sputtering (N₂ atmosphere) is recommended
R&D purposes: consider gradient composition target (Cu 0.5-4% gradient)

 

 

Related Sputtering Materials

 

AlCu99.5/0.5wt% Sputtering Target

AlCu99/1wt% Sputtering Target

AlCu98/2wt% Sputtering Target

AlCu95/5wt% Sputtering Target

AlCu90/10wt% Sputtering Target

AlSiCu 98.5/1/0.5wt% Sputtering Target

AlCuW 98.5/1/0.5 wt% Sputtering Target

 

 

FAQ

Are you a factory or manufacturer?
A: Yes, we are a factory but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.

What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.

Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process and we obtain raw material directly from its source.

Do you do spot quality inspection or full inspection?
A: 100% full inspection for sure. All unqualified products are discarded.

How do you ensure your lead time?
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.

What is the MOQ of Aluminium Copper (AlCu) Sputtering Target ?
A: Depends on quantity, generally, no MOQ limit.

How to pay for it?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time?
A: around 7-20 days which depends on the quantity and production.

What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo

What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.

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