Titanium Silicon Sputtering Target

Titanium Silicon Sputtering Target

Titanium Silicon Sputtering Target can provide nitride hard material layers with excellent properties, because silicon guarantees high oxidation resistance, while titanium provides special hardness and wear resistance. The combination of these two elements can be used at very high temperatures The bottom is wear-resistant.

Titanium Silicon Sputtering Target is a very commonly used alloy target in magnetron sputtering technology, which can be made into disc-shaped, tubular and plate-shaped targets by casting process. Its main purpose is to coat molds and tools with hard and wear-resistant coatings, which can improve the working efficiency and prolong the service life of processing tools.

Titanium Silicon Sputtering Target have the characteristics of high mechanical strength, good wear resistance, strong corrosion resistance and good impact resistance, suitable for automotive glass coating, display coating industry, semiconductor industry, electronic engineering, metal processing and decoration industry etc.

Specification of Titanium Silicon Sputtering Target

FAQ:

What is the MOQ?
A: Depends on quantity, generally, no MOQ limit.

How to pay for it?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time?
A: around 7-20 days which depends on the quantity and production.

What is the package?
A: cartoon case or plywood case.

What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.

What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.

Picture of Titanium Silicon Sputtering Target

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