Description of High Purity Titanium Sputtering Target
Titanium is a paramagnetic refractory metal with strong toughness and high strength, especially in an oxygen-free environment. For targets, the higher the chemical purity of the metal, the better the conductivity of the film made from it.
The purity of titanium sputtering targets is as high as 99.99%. It is mainly manufactured by electron beam cooling and smelting method, and finally various sizes and specifications of targets are made by various mechanical processing.
The thin film prepared by the High Purity Titanium Sputtering Target produced by our factory not only has high brightness, strong adhesion, uniform thickness, and durability, but also has strong electrical conductivity, wear resistance, and corrosion resistance.
High Purity Titanium Sputtering Target is one of the core materials for the preparation of integrated circuits, and is widely used in hardware tool coatings, automotive coatings, decorative coatings, glass coatings, flat panel display coatings and semiconductor devices and other fields.
Manufacturing Process of High Purity Titanium Sputtering Target
Melting: Electron beam melting (EBM) or vacuum arc melting (VAR) is used to remove volatile impurities.
Processing: Hot rolling, cold rolling, annealing, and other processes are carried out to ensure dimensional accuracy and surface quality.
Heat treatment: Usually, vacuum annealing is carried out at 650℃ to optimize grain size and residual stress.
Standard surface: mirror polished, surface roughness Ra≤0.4 μm.
Applications of High Purity Titanium Sputtering Target
Semiconductor manufacturing: copper interconnect barrier layer (Ti/TiN), electrode materials.
Optical coating: anti-reflection film, high reflective mirror (UV-IR band).
Decorative coating: gold coating of titanium nitride (TiN) for the mobile phone middle frame and the watch.
New energy: lithium-ion battery current collector coating, fuel cell bipolar plate.
Medical devices: biocompatible coating (such as surface treatment of orthopedic implants).
Specifications of High Purity Titanium Sputtering Target
|
Material |
Ti-75Al,Ti-70Al,Ti-67Al,Ti-60Al,Ti-50Al,Ti-30Al,Ti-20Al |
|
Purity |
≥99.7% |
|
Diameter |
Customized |
|
Thickness |
Customized |
|
Density |
3.1-4.3g/cm3 |
|
Surface |
Polished, Bright, Chemical Cleaning, Black Oxide, etc. |
|
Shape |
Round |
|
Deliver time |
25 days |
|
Standard |
ASTM |
Testing and Quality Control of High Purity Titanium Sputtering Target
FAQ for High Purity Titanium Sputtering Target
What is the MOQ?
A: Depends on quantity, generally, no MOQ limit.
How to pay for it?
A: A bank transfer (T/T) will be acceptable.
What is the delivery time?
A: around 7-20 days, which depends on the quantity and production.
What is the package?
A: cartoon case or plywood case.
What is the lead time?
A: From the order placed to cargo receiving will take around 10-25 days.
What is the delivery method?
A: Generally, we send cargo by UPS, DHL, or FedEx. Also, we can send by sea to a seaport or by air to the closest airport.
Picture of High Purity Titanium Sputtering Target
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