Products Description
Titanium Aluminum Alloy are widely used in vacuum coating industry. It can be made to alloy targets with a certain ratio and used as raw materials for PVD.
Titanium Aluminum Sputtering Targets by the advanced hot isostatic pressing process. These are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. Reason of this usage is high ductility (Long service life), high thermal conductivity, and homogeneous microstructure.
When making vacuum coating targets, titanium aluminum alloy has several component ratios. Titanium aluminum alloy sputtering target can be made by two methods, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application.
Features of Titanium Aluminum Alloy PVD Targets:
1. Low Density and High Specification Strength
2. Excellent Corrosion Resistance
3. Good Resistance to Effect of Heat
4. Excellent Bearing to Cryogenics Property
5. Nonmagnetic and Non-toxic
6. Good Thermal Properties
7. Low Modulus of Elasticity
Applications of Titanium Aluminum Alloy PVD Targets:
Hard Coatings
Corrosion Protection
Thermal Barrier Coatings
Decorative Coatings
Specification of Titanium Aluminum Alloy PVD Targets
|
Material |
Titanium Aluminum Alloy PVD Targets |
|
Purity |
99.9%-99.995%, 3N, 3N5, 4N, 4N5 |
|
Size |
D50.8x3mm, 2inch, 3inch, Or As Request |
|
Color |
Metallic Color |
|
Shape |
Planar/Round/Plate/Rotary/Bar , As Request. |
|
Surface |
Polished Surface |
|
Ti Density |
4.54g/cm³ |
|
Ti Melting Point |
1668°C |
|
Application |
PVD Film Coating, Optical Thin Film Coating, Industry Usage, Process, Semidoductor area, Experiments etc |
|
Related Item |
Al, Mg, Cu, Ni, Co, Fe, Zn, Sn, Bi, Ga, Ge, In, V, W, Mo, Nb, Ta, Cr, Zr, Ti, Hf etc + Metal Alloy sputtering targets+Ceramic targets |
|
Note |
Support customize size, shape, purity, different alloy proportion etc. |
FAQ:
What is the MOQ?
A: Depends on quantity, generally, no MOQ limit.
How to pay for it?
A: A bank transfer (T/T) will be acceptable.
What is the delivery time?
A: around 7-20 days which depends on the quantity and production.
What is the package?
A: carton case or plywood case.
What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.
What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.
What are TiAl PVD targets?
Specialized materials for physical vapor deposition (PVD) processes, precision-engineered from titanium (Ti) and aluminum (Al) alloys to deposit high-performance coatings on substrates.
Available composition ratios?
Standard configurations:
Ti30/Al70: High aluminum for oxidation resistance
Ti50/Al50: Balanced properties
Custom ratios: Adjustable between Ti20/Al80 to Ti60/Al40
Primary applications?
Cutting tools: Surface hardening for end mills/inserts
Aero engines: Thermal barrier coating interlayers
Semiconductors: Diffusion barriers (<3nm nodes)
Decorative coatings: Consumer electronics frames
Advantages over pure metal targets?
30-50% better adhesion
200-300°C higher oxidation resistance
Enables graded composition deposition
Reduced arcing tendency
Composition selection guide?
High-temp: ≥60% Al
Wear resistance: ≥40% Ti
Semiconductor: 5N purity
Usage considerations?
Requires magnetron power (DC/RF)
Optimal substrate temp: 200-400°C
Operating pressure: 0.3-0.6Pa
Regular target rotation recommended
Customization options?
Available:
Non-standard shapes (rings/rectangles)
Bonding (Cu/Mo backplates)
Surface finishing (polish to Ra0.2μm)
Ordering information
Standard sizes: Φ50.8mm-Φ152.4mm
MOQ: 1pc (R&D samples)
Lead time: 15 days for standard specs
Consult our PVD specialists for technical inquiries
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