China TiAl Targets Manufacturers Factory Suppliers
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Titanium Aluminum Sputtering TargetsTitanium aluminum (TiAl) sputtering targets are made of an alloy composed of titanium and aluminum. These targets are used in the sputtering process, a technique of physical vapor deposition...read more
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Mo-La Alloy FoilsMo-La Alloy Foils is suitable for lighting, electric vacuum devices, tubular components in power semiconductor devices, internal parts of light bulbs, heating elements of glass fiber furnaces,...read more
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Titanium-aluminum TiAl TargetsTitanium-aluminum TiAl Targets can improve the hardness and service life of cutting tools, and are widely used in hardware tool coatings, decorative coatings, flat display coatings, PVD and CVD...read more
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Titanium Aluminum TI-Al Round TargetTitanium Aluminum TI-Al Round Target are commonly used metal targets for vacuum coating. Different properties can be obtained by blending the content of titanium and aluminum. They are very...read more
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Titanium Aluminum Alloy Round BarTitanium Aluminum Alloy Round Bar is used in the aerospace field (used to manufacture aircraft, missiles, satellites and other flight devices), the automotive industry (used to manufacture...read more
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Titanium Aluminium TiAl PVDTargetTitanium Aluminium TiAl PVD Target can also be used to manufacture coatings for drill bits and other tools and dies. These coatings can greatly improve the cutting speed and cutting performance of...read more
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TIAl Sputtering TargetTIAl Sputtering Target can sputter hard and oxidation-resistant nitride coatings (TiAlN) on drills, cutters, indexable cutting inserts and other tools, and improve the feed rate, cutting...read more
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Ti-Al Alloy PVD TargetTi-Al Alloy PVD Target are often made by smelting casting method and powder sintering method, and can be widely used in many vacuum coating fields such as decoration, mold processing, glass,...read more
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Al-Ti Alloy Sputtering TargetAl-Ti Alloy Sputtering Target is often made by vacuum smelting manufacturing method. It has a series of excellent properties of titanium and zirconium, such as high hardness, high temperature...read more
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Ti33Al67 TargetTi33Al67 target, also known as titanium aluminide target, refers to a material that consists of a 33% titanium (Ti) and 67% aluminum (Al) composition. Ti33Al67 target is often used in thin-film...read more
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Sputtering Target Ti50Al50Sputtering target Ti50Al50 is a kind of target material with a 50% titanium (Ti) and 50% aluminum (Al) composition, which is used in the sputtering process for depositing thin films. Sputtering is...read more
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Titanium Aluminum Alloy PVD TargetsTitanium aluminum alloy PVD (Physical Vapor Deposition) targets are specialized materials used in the PVD process to deposit thin films of the alloy onto various substrates. Titanium Aluminum...read more
WEBHighlights. We study the influence of two target types on the microstructure and mechanical properties of TiAlN coatings. Deposition rate, microstructure, surface morphology and...
WEBOur titanium-aluminum (TiAl) targets and cathodes ensure hard and oxidation-resistant nitride coatings (TiAlN) on drills, cutters, indexable cutting inserts, and other tools. Fast...
WEBSemantic Scholar extracted view of "A comparative research on TiAlN coatings reactively sputtered from powder and from smelting TiAl targets at various nitrogen flow rates" by...
WEBTiAl (99.95%) and Al (99.9%) targets were sputtered in high purity plasma of Ar (99.999%) and N 2 (99.999%). The composition of the TiAl target was approximately 50:50 in...
WEBIt is clear that the microstructures of the two types of targets are distinguishable: the elements of Ti and Al in smelting target forms alloying organization, which are TiAl...
WEBA composite TiAl target (Ti-50%, Al-50%) with a size of 88 mm × 500 mm from PLANSEE AG (Reutte, Austria) was used for the experiments in a reactive sputtering mode. The...
