China Titanium Aluminum Alloy PVD Targets Manufacturers Factory Suppliers
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Titanium Aluminum Alloy PVD TargetsTitanium aluminum alloy PVD (Physical Vapor Deposition) targets are specialized materials used in the PVD process to deposit thin films of the alloy onto various substrates. Titanium Aluminum...read more
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Mo-La Alloy FoilsMo-La Alloy Foils is suitable for lighting, electric vacuum devices, tubular components in power semiconductor devices, internal parts of light bulbs, heating elements of glass fiber furnaces,...read more
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Titanium-aluminum TiAl TargetsTitanium-aluminum TiAl Targets can improve the hardness and service life of cutting tools, and are widely used in hardware tool coatings, decorative coatings, flat display coatings, PVD and CVD...read more
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Titanium Grade 7 Round BarTitanium Grade 7 Round Bar are made of corrosion-resistant titanium-palladium alloy through powder metallurgy process. They can be widely used in the aerospace industry (parts of aircraft and...read more
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Titanium Aluminum TI-Al Round TargetTitanium Aluminum TI-Al Round Target are commonly used metal targets for vacuum coating. Different properties can be obtained by blending the content of titanium and aluminum. They are very...read more
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Titanium Aluminum Alloy Sputtering TargetTitanium Aluminum Alloy Sputtering Target by the advanced hot isostatic pressing process. These are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat...read more
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Ti-Al Alloy Sputtering TargetTiAl Alloy Sputtering Target are very suitable for various metallurgical tool coatings, flat panel display coatings (such as watches, mobile phones and computers) and decorative coatings, and are...read more
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Aluminum Titanium Alloy Sputtering TargetAluminum Titanium Alloy Sputtering Target is generally produced by hot isostatic pressing process, which has smaller grain size and more uniform microscopic internal structure, which can help...read more
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Al-Ti Alloy Sputtering TargetAl-Ti Alloy Sputtering Target is often made by vacuum smelting manufacturing method. It has a series of excellent properties of titanium and zirconium, such as high hardness, high temperature...read more
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Ti33Al67 TargetTi33Al67 target, also known as titanium aluminide target, refers to a material that consists of a 33% titanium (Ti) and 67% aluminum (Al) composition. Ti33Al67 target is often used in thin-film...read more
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Sputtering Target Ti50Al50Sputtering target Ti50Al50 is a kind of target material with a 50% titanium (Ti) and 50% aluminum (Al) composition, which is used in the sputtering process for depositing thin films. Sputtering is...read more
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Titanium Aluminum Sputtering TargetsTitanium aluminum (TiAl) sputtering targets are made of an alloy composed of titanium and aluminum. These targets are used in the sputtering process, a technique of physical vapor deposition...read more
WEBTantalum (Ta) Coilset. A full range of 200mm and 300mm coil sets in Titanium (Ti) are available in a variety of configurations, purity and surface treatments. Titanium (Ti)...
WEBChemical Formula: Al/Ti. Catalog Number: ST0068. CAS Number: 12004-39-6. Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%. Shape: Discs, Plates, Column Targets,...
WEBTell us what vacuum deposition equipment you are using and we can provide you the specifications you need. We supply pure PVD metal targets including gold sputtering...
WEBSputtering Targets: Tantalum, Tungsten, Titanium, AZO, Copper, Aluminum & Platinum | Praxair, Inc. SPUTTERING TARGETS FOR THE ELECTRONICS INDUSTRY....
WEBOur specialty sputtering thin film target materials include Au, Pt, Pd, Al, AlSiCu, AlCu, Cu, Ti, Ni, Ta, Nb, WSi, MoSi, NiPt, TiAl and WTi - in all target shapes and sizes - round,...
WEBAmerican Elements specializes in producing high purity Titanium Aluminum Sputtering Targets with the highest possible density and smallest possible average grain sizes for...
