Products Description
Titanium aluminum (TiAl) sputtering targets are made of an alloy composed of titanium and aluminum. These targets are used in the sputtering process, a technique of physical vapor deposition (PVD), to deposit thin films of titanium aluminum onto various substrates. The deposition of these thin films can provide surfaces with enhanced properties such as high strength, low density, good oxidation resistance, and high-temperature performance.
Features of Titanium Aluminum Sputtering Targets
- Alloy Composition: The composition of titanium aluminum can be tailored to achieve specific properties. The balance between titanium and aluminum can affect the microstructure, strength, and corrosion resistance of the resulting thin film.
- High Strength: TiAl alloys are known for their high strength, which can be beneficial in applications requiring mechanically robust coatings.
- Low Density: The low density of titanium aluminum can make it an attractive choice for applications where weight reduction is important.
- Oxidation Resistance: TiAl alloys form a stable oxide layer that provides good resistance to oxidation at elevated temperatures.
- Thermal Properties: The alloy has good thermal conductivity and can be used in applications where efficient heat transfer is required.
Applications of Titanium Aluminum Sputtering Targets
Aerospace and Automotive: TiAl coatings can be used to enhance the performance of aerospace and automotive components, providing increased strength and resistance to high temperatures and oxidation.
Electronics: In the electronics industry, TiAl coatings can be used for interconnects and other applications where good electrical conductivity and corrosion resistance are needed.
Chemical Processing: The corrosion resistance of TiAl coatings makes them suitable for use in chemical processing equipment where exposure to harsh chemicals is expected.
Medical Devices: TiAl coatings can be applied to medical devices for improved biocompatibility and resistance to corrosion.
Specification of Titanium Aluminum Sputtering Targets
|
Titanium Aluminum Sputtering Target |
Properties |
Properties |
Properties |
|
Composition (at%) |
Ti33Al67 |
Ti50Al50 |
Ti70Al30 |
|
Purity |
99.80% |
99.80% |
99.80% |
|
Density g/cm³ |
3.29 |
3.6 |
3.95 |
|
Grain size (um) |
≤100 |
≤100 |
≤100 |
|
Thermal Conductivity (W/m.k) |
98 |
70 |
40 |
|
Coefficient of Thermal Expansion (K) |
1.9 x 10-5 |
1.75 x 10-5 |
1.35 x 10-5 |
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