TIAl Sputtering Target

TIAl Sputtering Target

Magnetron sputtering technology is one of the key technologies for preparing thin film materials, and the metal sputtering target is the key material in the sputtering process.

TIAl Sputtering Target has the excellent characteristics of metal titanium and metal aluminum, such as high ductility, high wear resistance, excellent electrical and thermal conductivity, optimal microstructure, good durability, etching performance and processing performance Good, good bonding performance with the substrate, etc.

TIAl Sputtering Target can sputter hard and oxidation-resistant nitride coatings (TiAlN) on drills, cutters, indexable cutting inserts and other tools, and improve the feed rate, cutting performance and service life of processing tools.

TIAl Sputtering Target also produces adhesive and capping layers in integrated circuits, decorative coatings for electronic devices (such as dials for cell phones, flat panel displays, or luxury watches), and glass coatings for the automotive industry.

Specification of TIAl Sputtering Target

FAQ:

What is the MOQ?
A: Depends on quantity, generally, no MOQ limit.

How to pay for it?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time?
A: around 7-20 days which depends on the quantity and production.

What is the package?
A: cartoon case or plywood case.

What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.

What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.

Picture of TIAl Sputtering Target

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