PVD Coating Material

• Lithium Manganate (LiMn2O4) Sputtering Target

  Lithium manganate sputtering target is a black sputtering material with the element Li, Mn and O. It is a conductive ceramic solid electrolyte material for lithium-ion batteries.

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• Lithium Cobaltate (LiCoO2) Sputtering Target

  Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.

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• Yttrium Oxide (Y2O3) Sputtering Target

  Purity: 99.99%;
  Production Method: hot press sintering;
  Available dimensions:
  

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• Zirconium Oxide (ZrO2) Sputtering Target

  We produce and supply full range of ceramic sputtering targets and compound targets, including oxide sputtering targets, carbide sputtering targets, fluoride sputtering targets, sulfide sputtering...

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• Lithium Nniobate (LiNbO3) Sputtering Target

  Our factory can produce and supply full range of ceramic sputtering targets and compound targets, including oxide sputtering targets, carbide sputtering targets, fluoride sputtering targets,...

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• Zinc Oxide/Aluminum Oxide (AZO-ZnO/Al2O3) Sputtering Target

  Our factory producing high purity Aluminum-doped Zinc Oxide (AZO) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical...

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• Tungsten Titanium (WTi) Sputtering Target

  Tungsten Titanium Sputtering Targets are produced by powder metallurgy technology which are widely used for semiconductor and thin film solar cells. Our factory can produce WTi 90/10wt%, WTi...

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• Aluminium Neodymium (AlNd) Sputtering Target

  Aluminum neodymium alloy is a commonly used magnetron sputtering target. Aluminum has a melting point of 660℃, density of 2.7, and thermal conductivity of 0.53, while neodymium has a melting point...

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• Aluminium Copper (AlCu) Sputtering Target

  Aluminum Copper sputtering target is perfect for a number of industries and applications, due to its high hardness, tensile strength and light weight. It has usually 1-3% copper content and has...

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• Aluminium Scandium (AlSc) Sputtering Target

  Scandium has a good dispersion strengthening effect on aluminum. It is a stable non-recrystallization structure during hot working or annealing state. Some alloys are cold rolled plates, which...

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• Aluminium Silicon (AlSi) Sputtering Target

  The targets are prepared by blending Aluminum and Silicon powders followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired...

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• Aluminum Chromium (AlCr) Sputtering Target

  Our aluminum-chromium alloy target adopts advanced hot isostatic pressing process. The products include rectangular target, arc target and large aspect ratio integrally formed tube target, etc.,...

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