PVD Coating Material

• Tungsten Titanium (WTi) Sputtering Target

  Tungsten Titanium Sputtering Targets are produced by powder metallurgy technology which are widely used for semiconductor and thin film solar cells. Our factory can produce WTi 90/10wt%, WTi...

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• Aluminium Neodymium (AlNd) Sputtering Target

  Aluminum neodymium alloy is a commonly used magnetron sputtering target. Aluminum has a melting point of 660℃, density of 2.7, and thermal conductivity of 0.53, while neodymium has a melting point...

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• Aluminium Copper (AlCu) Sputtering Target

  Aluminum Copper sputtering target is perfect for a number of industries and applications, due to its high hardness, tensile strength and light weight. It has usually 1-3% copper content and has...

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• Aluminium Scandium (AlSc) Sputtering Target

  Scandium has a good dispersion strengthening effect on aluminum. It is a stable non-recrystallization structure during hot working or annealing state. Some alloys are cold rolled plates, which...

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• Aluminium Silicon (AlSi) Sputtering Target

  The targets are prepared by blending Aluminum and Silicon powders followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired...

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• Aluminum Chromium (AlCr) Sputtering Target

  Our aluminum-chromium alloy target adopts advanced hot isostatic pressing process. The products include rectangular target, arc target and large aspect ratio integrally formed tube target, etc.,...

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• Copper Nickel (CuNi) Sputtering Target

  Copper-nickel (CuNi) sputtering target has important applications in the electronics industry. The targets produced by our company are silvery white and have a metallic luster. The copper content...

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• Copper Nickel Titanium (CuNiTi) Sputtering Target

  Our CuNiTi sputtering targets combine the excellent conductivity of copper, the excellent corrosion resistance of nickel, and the outstanding mechanical strength of titanium to create an alloy...

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• Iron Chromium (FeCr) Sputtering Target

  The iron chromium (FeCr) alloy sputtering target is grayish black in colour. We produce iron chromium alloy sputtering target with different iron and chromium content by vacuum induction melting...

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• Aluminum Titanium (AlTi) Sputtering Target

  Aluminum Titanium (AlTi) Sputtering Target are produced by HIP technology, widely used for tool coating and decorative coating.Compared to melting technology, TiAl targets that produced by HIP...

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• Iron Manganese (FeMn) Sputtering Target

  Our iron manganese (FeMn) sputtering targets are made of high purity (≥99.9%) alloy materials and are used for sputtering deposition of magnetic or conductive films. Regular shapes include discs,...

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• Nickel Chromium (NiCr) Sputtering Target

  Nickel Chromium (NiCr) Sputtering Target are used for depositing nickel chromium alloy resistive film by PVD technology, the nickel chromium film has high resistivity, low temperature coefficient...

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