PVD Coating Material

• Cobalt Tantalum Zirconium (CoTaZr) Alloy Target

  Cobalt Tantalum Zirconium (CoTaZr) Alloy Target is produced by melting technology, it's usually applied for magnetic data storage field. With up to 3N5 purity, uniform grain size, lower oxygen...

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• Cerium Gadolinium (CeGd) alloy Target

  Cerium Gadolinium Alloy Sputtering Target (CeGd) is a key material in thin-film deposition. This alloy, combining cerium and gadolinium, offers unique properties for coating applications. CeGd...

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• Beryllium Sputtering Target

  Our beryllium(Be) sputtering targets are made of high purity beryllium material, which is a silvery-white metal, relatively soft and has a low density.

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• Chromium Sputtering Target

  Chromium sputtering target has the same properties as metal chromium (Cr), Chromium is a chemical element with the symbol Cr and atomic number 24, it is a steely-grey, lustrous, hard and brittle...

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• Ruthenium Sputtering Target

  Ruthenium sputtering targets are used for depositing Ru thin film, which is a important intermediate film in the structure of perpendicular magnetic recording multi-layer films.

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• Scandium Sputtering Target

  Scandium is a chemical element with symbol Sc and atomic number 21, It is a soft, silver-white transition metal with a melting point of 1541℃ and a boiling point of 2831℃. Easy to dissolve in...

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• Pure Selenium Sputtering Target

  Selenium is a non metallic chemical element, member of the group XVI of the periodic table. In chemical activity and physical properties it resembles sulfur and tellurium. Selenium metal conducts...

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• Silicon Sputtering Target

  Polysilicon sputtering target is a key material used in the semiconductor, photovoltaic and display industries. It is mainly used to make polysilicon thin films and is widely used in transistors,...

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• Tin Sputtering Target

  Tin sputtering targets are made of 99.99% pure tin of high purity and have a pure silvery gray look, a melting point of 232°C, and a density of 7.28 g/cm3. They are a vital part of the thin film...

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• Titanium Sputtering Target

  The titanium sputtering target is made of titanium metal. As a metal, titanium is recognized for its high strength-to-weight ratio. It is a strong metal with low density that is quite ductile...

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• Tungsten Sputtering Target

  Tungsten sputtering targets are made of high-purity tungsten metal, which is usually fragile and difficult to process. If tungsten is made into a very pure material, it can maintain its hardness...

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• Pure Vanadium Sputtering Target

  Vanadium sputtering target shares properties with its source material. Vanadium is a chemical element with symbol V and atomic number 23. It is a hard, silvery-grey, ductile, malleable transition...

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