PVD Coating Material

• Erbium Sputtering Target

  Erbium is a chemical element in the lanthanide series, with the symbol Er and atomic number 68. A silvery-white solid metal when artificially isolated, natural erbium is always found in chemical...

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• Gadolinium Sputtering Target

  The gadolinium sputtering target is a composed of high-purity metal europium (Gd). It has a melting point of 1312°C, a boiling point of 3250°C, and a density of 7.895g/cm3. Gadolinium is a...

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• Germanium Sputtering Target

  Germanium is a chemical element with the symbol Ge and atomic number 32. It is a lustrous, hard-brittle, grayish-white metalloid in the carbon group, chemically similar to its group neighbours...

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• Holmium Sputtering Target

  Holmium has shown key application value in cutting-edge science and technology fields due to its unique optoelectronic and electromagnetic properties.

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• Hafnium Sputtering Target

  Hafnium sputtering target has the same performance as metal hafnium (Hf). Hafnium with melting point of 2233°C, boiling point of 4603°C, and density of 13.31g/cm3. It is a shiny silver-gray...

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• Indium Sputtering Target

  The indium sputtering target is a silver glossy gray target composed of high-purity indium (In). Its melting point is 156.61°C, boiling point is 2060°C, and density is 7.3 g/cm3. The texture is...

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• Bismuth Sputtering Target

  Bismuth sputtering target is made of bismuth element, which is commonly used in magnetron sputtering, electron beam coating and other processes. Bismuth is a chemical element with the symbol Bi...

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• Aluminum Sputtering Target

  Aluminum sputtering targets are of high purity, typically 99.99% or higher. Aluminum has a melting point of 660°C and a thermal conductivity of 235 W/m·K, properties that make it excellent in...

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• Tantalum Sputtering Target

  Element Symbol:Ta
  Purity:3N5, 4N, 4N5, 5N
  Shape:Planar target, Rotary target
  

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