Products Description
As an important member of rare earth metals, Holmium has shown key application value in cutting-edge science and technology fields due to its unique optoelectronic and electromagnetic properties.
Holmium sputtering target is a silver metal target made of high-purity Holmium (Ho) metal. It has a melting point of 1474°C, a boiling point of 2695°C, and a density of 8.79g/cm3.
Holmium is a relatively soft and malleable element that is fairly corrosion-resistant and stable in dry air at standard temperature and pressure. In moist air and at higher temperatures, however, it quickly oxidizes, forming a yellowish oxide. In pure form, holmium possesses a metallic, bright silvery luster.
Specification:
| Characteristic | Value | Application Correlation |
|---|---|---|
| Atomic Number | 67 | Location of rare earth elements |
| Density | 8.79 g/cm³ | Basis for calculating film deposition rate |
| Melting Point | 1474°C | Setting high-temperature sputtering process window |
| Magnetic Moment | 10.6 μB (4f¹⁰ electron configuration) | Development of spintronic devices |
| Resistivity | 814 nΩ·m | Design of thin film circuits |
| Neutron Capture Cross Section | 64 barns | Neutron absorption material in nuclear reactors |
Application
(1) Quantum technology field
Superconducting quantum bits: Ho₂O₃ thin film is used as the barrier layer of the Josephson junction (coherence time is increased by 30%)
Topological quantum computing: HoBi₂ compound thin film is used to prepare the Majorana fermion research platform
(2) Advanced optoelectronic devices
2.1μm laser: Ho:YAG thin film as gain medium (medical/military laser)
Upconversion luminescence: Ho³⁰ doped ZnO thin film realizes visible-near infrared band conversion
(3) Nuclear industry system
Neutron poison control rod: HoB₆ target material is used to prepare absorption coating (better than traditional Cd material)
Radiation detection: Ho-doped scintillator film (γ-ray detection efficiency 92%)
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Related Sputtering Materials
Ho2O3 sputtering target
FAQ
Are you a factory or manufacturer?
A: Yes, we have a factory but we generally use our trading company to handle the business abroad. It will be convenient to receive the remittance and arrange the shipment.
What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.
Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process. We obtain our raw material directly from its source.
Do you do spot quality inspection or full inspection?
A: 100% full inspection. Inspectors will check the finished product individually, to ensure they adhere to all parameters. All unqualified products are discarded.
How do you ensure your lead time?
A: We have an efficient Order Management System, from material preparation to machining, and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.
What is the MOQ ?
A: Depends on quantity, generally, no MOQ limit.
How to pay for it?
A: A bank transfer (T/T) will be acceptable.
What is the delivery time?
A: around 7-20 days which depends on the quantity and production.
What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo
What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.
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