Silicon Nitride (Si3N4) Sputtering Target
Silicon Nitride (Si3N4) Sputtering Target

Silicon Nitride (Si3N4) Sputtering Target

Our silicon nitride sputtering target is a high-purity ceramic material used in physical vapor deposition (PVD) process, usually provided in the form of dense discs or rectangular blocks.
Send Inquiry
Products Description

 

Silicon nitride sputtering target is a type of nitride ceramic sputtering target. Si3N4 is a high-melting-point ceramic material that is extremely hard and relatively chemically inert. Si3N4 is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen. Then the powder of silicon nitride can be sintered to the designed shape. Silicon nitride sputter target is used for thin film deposition.

 

Our silicon nitride sputtering target is a high-purity ceramic material used in physical vapor deposition (PVD) process, usually provided in the form of dense discs or rectangular blocks. Its main component is stoichiometric or non-stoichiometric silicon nitride (Si3N4 or SiNₓ), which has high hardness, excellent chemical stability, high temperature resistance and good dielectric properties.

 

The size information of silicon nitride (Si3N4) target as follows:

Diameter: 1 inch, 2 inches, 3 inches, 4 inches, 5 inches and other different diameters.
Thickness: 1mm, 2mm, 3mm, 4mm and other sizes can be customized.

 

Specification Silicon Nitride (Si3N4) Sputtering Target

 

Product Name

Silicon nitride sputtering target

Available Purity

99.9%min,as request

Available shape

round, rectangular,pellets

Size

Negotiable

Technolgy

powder metallurgy

Application

Vaccum coating,Process,Decoration,LED,Semi,

Related products

ZrO2.SiN,LaB6,Cr2O3,C,B,and etc

 

 

Application of Silicon Nitride (Si3N4) Sputtering Target

 

  • Semiconductor devices

Gate dielectric layer:

EOT<1nm (equivalent oxide layer thickness)

Leakage current<10⁻⁷ A/cm²@1MV/cm

Etch stop layer:

Selectivity (Si₃N₄/SiO₂)>50:1

 

  • Mechanical engineering

Tool coating:

Cutting speed increased by 3 times (vs. uncoated)

Life extended by 5-8 times

 

Bearing protection:

Friction coefficient 0.1-0.2 (dry friction conditions)

 

  • Biomedical

Orthopedic implants:

Bacterial adhesion rate reduced by 90%

Bone integration cycle shortened by 30%

 

 

FAQ of Silicon Nitride (Si3N4) Sputtering Target


Are you a factory or manufacturer?
A: Yes, we are a factory but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.

What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.

Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process and we obtain raw material directly from its source.

Do you do spot quality inspection or full inspection?
A: 100% full inspection for sure. All unqualified products are discarded.

How do you ensure your lead time?
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.

What is the MOQ of Silicon Nitride (Si3N4) Sputtering Target ?
A: Depends on quantity, generally, no MOQ limit.

How to pay for it?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time?
A: around 7-20 days which depends on the quantity and production.

What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo

What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.

 

Hot Tags: silicon nitride (si3n4) sputtering target, China silicon nitride (si3n4) sputtering target suppliers, factory, Gr 2 Titanium Plate, , , , Rectangular Neodymium Pot Magnet, Beryllium Copper Wire