Customizable 4N Carbon Sputtering Target
Customizable 4N Carbon Sputtering Target

Customizable 4N Carbon Sputtering Target

Our high-purity 4N carbon sputtering targets are fabricated from 99.99% pure carbon material, featuring low impurity levels and making them ideal for applications in semiconductors, optical thin films, and scientific research coatings. Characterized by a dense and uniform structure as well as excellent electrical conductivity, these targets ensure stable film deposition during sputtering. We offer customization options for both size and shape to meet the specific requirements of various equipment systems.
Send Inquiry
Description Of Customizable 4N Carbon Sputtering Target

 

Customizable 4N carbon sputtering targets are high-purity (99.99%) core consumables for thin-film deposition, widely utilized in high-end manufacturing sectors such as semiconductors, display panels, and photovoltaic cells. Their core value lies in their ability to make flexible adjustments-regarding purity, specifications, and composition-to align with specific application requirements, thereby meeting the rigorous demands of thin-film performance across diverse coating processes.

 

Features Of Customizable 4N Carbon Sputtering Target

 

High-Purity Assurance: A purity level of 4N (99.99%) constitutes the fundamental requirement for sputtering targets used in fields such as solar cells and flat-panel displays, ensuring that the deposited thin films exhibit extremely low impurity levels and stable, reliable performance.
Flexible Customization: We offer support for flexible customization tailored to specific equipment chamber configurations and process requirements, enabling the production of various target shapes-such as planar targets and rotatable tubular targets-and specific dimensions (e.g., diameter and thickness).
Composite Structure Design: Commercial sputtering targets typically consist of a target body (the functional layer) welded to a backing plate (serving as a support, thermal conductor, and electrical conductor). Our customization services include selecting the most suitable backing plate materials (such as oxygen-free copper or aluminum alloys) and ensuring a high-integrity weld bond to effectively meet thermal dissipation and electrical conductivity requirements.
Precise Composition Tuning: For compound or alloy-based carbon targets (e.g., chromium carbide), we offer the capability to precisely adjust the carbon content ratio, thereby optimizing specific thin-film properties such as hardness, wear resistance, or electrical conductivity.

 

Applications Of Customizable 4N Carbon Sputtering Target

 

Semiconductor Integrated Circuits: Used as diffusion barrier layers or contact layer materials, requiring strict adherence to high-purity and high-uniformity standards.
Flat Panel Displays: Employed in the fabrication of transparent conductive films or other functional layers, serving as one of the critical materials in display technology.
Solar Photovoltaic Cells: Utilized for the deposition of electrodes or anti-reflective layers to enhance cell conversion efficiency.
Functional Coatings: Applied to the surfaces of tools and components to create ultra-hard, wear-resistant, and corrosion-resistant carbon-based coatings (such as diamond-like carbon films).

 

Specifications Of Customizable 4N Carbon Sputtering Target

 

Material: Carbon (Graphite / Amorphous Carbon)
Purity: 99.9%–99.999%
Form: Planar Target, Rotary Target, Bonded or Unbonded
Size: Customized Dimensions

 

Quality Control and Testing Of Customizable 4N Carbon Sputtering Target

 

1QC

 

FAQ For Customizable 4N Carbon Sputtering Target

 

Are you a factory or a manufacturer?
A: Yes, we are a Customizable 4N Carbon Sputtering Target factory, but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.

What is the delivery method?
A: Generally, we send the Customizable 4N Carbon Sputtering Target by UPS, DHL, or FedEx. Also, we can send by sea to a seaport or by air to the closest airport.

Why is your Customizable 4N Carbon Sputtering Target so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process, and we obtain raw material directly from its source.

Do you do spot quality inspection of products?
A: 100% full inspection for sure. All unqualified Customizable 4N Carbon Sputtering Targets are discarded.

How do you ensure your lead time?
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.

What is the MOQ of the Customizable 4N Carbon Sputtering Target?
A: Depends on the quantity of Customizable 4N Carbon Sputtering Target; generally, no MOQ limit.

How to pay for the products?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time​​​​?
A: Around 7-20 days, which depends on the quantity and production of the Customizable 4N Carbon Sputtering Target.

What kind of package is it?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the safety of the Customizable 4N Carbon Sputtering Target.

What is the lead time​​​​?
A: From the order placed to cargo receiving will take around 10-25 days.

 

3

 

Hot Tags: customizable 4n carbon sputtering target, China customizable 4n carbon sputtering target suppliers, factory