Cerium Gadolinium (CeGd) alloy Target

Cerium Gadolinium (CeGd)  target is widely used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display and optical applications. It has the characteristics of high purity and density, low particles, uniform film thickness distribution and high utilization efficiency. The size of CeGd sputtering target includes round sputtering target with diameter from 1.0" to 21", rectangular sputtering target with various width and length, and thickness of 0.125" and 0.25" are available. 

Composition: alloy or compound of cerium (Ce) and gadolinium (Gd), usually Ce:Gd = 1:1 or adjusted according to demand

Purity: usually ≥99.9% (3N), high purity ≥99.99% (4N)

Crystal structure: depending on the composition, may be cubic (CeGdOₓ) or hexagonal (metal alloy)

Density: ~7.0-8.0 g/cm³ (depending on the composition)

Melting point: about 1500-2000°C (due to oxidation state changes)

Neutron absorption ability (Gd has high neutron capture cross section)

Catalytic activity (Ce redox properties)

Magnetocaloric effect (low temperature magnetic order of Gd)

(1) Nuclear industry
Neutron absorber: Gd has a high neutron capture cross section (49,000 barn) and is used for reactor control rod coating

Radiation shielding material: CeGdOₓ composite coating

(2) Energy materials
Solid oxide fuel cell (SOFC): CeGdO₂₋ₓ as electrolyte (oxygen ion conductor)

Thermoelectric materials: Ce-Gd alloy optimizes thermoelectric coefficient

(3) Catalysis field
Automobile exhaust treatment: CeGdOₓ oxygen storage material (three-way catalyst)

Water decomposition to produce hydrogen: Ce-Gd co-catalyst

(4) Functional coating
Infrared stealth coating: CeGdOₓ regulates thermal radiation

Magnetic refrigeration material: magnetocaloric effect of Gd-based film

Raw material ratio:

High purity Ce (≥99.9%) and Gd (≥99.9%) are mixed in proportion

Melting/sintering:

Vacuum arc melting (alloy target)

High temperature solid phase reaction (oxide target, 1400-1600°C)

Forming:

Hot isostatic pressing (HIP) to improve density

Wire cutting or laser cutting into target material

Surface treatment:

Polishing to Ra<0.5μm (reduce sputtering particles)

CeGd 90/10at% sputtering target

CeGd 80/20at% sputtering target 

Component: Custom-Made

Shape: Discs, Plate, Step (Dia 300mm,, Thickness 1mm) Rectangle, Sheet, Step (Length 500mm, Width 200mm, Thickness 1mm) Tube( Diameter< 300mm, Thickness >2mm )

FAQ

Are you a factory or manufacturer?
A: Yes, we are a factory but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.

What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.

Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process and we obtain raw material directly from its source.

Do you do spot quality inspection or full inspection?
A: 100% full inspection for sure. All unqualified products are discarded.

How do you ensure your lead time?
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.

What is the MOQ of Cerium Gadolinium (CeGd) Target ?
A: Depends on quantity, generally, no MOQ limit.

How to pay for it?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time?
A: around 7-20 days which depends on the quantity and production.

What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo

What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.

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