Ruthenium Sputtering Target

Ruthenium is a chemical element with the symbol Ru and atomic number44. It is a rare transition metal belonging to the platinum group of the periodic table.  The ruthenium target produced by our company is made of pure ruthenium (Ru) for target application. Our ruthenium target is gray with a melting point of 2334°C, a density of 12.37g/cm³, and a thermal expansion of 6.4 μm/(m·K). Ruthenium targets have good heat resistance, corrosion resistance, and mechanical strength, and are suitable for use in high temperature, high pressure, and corrosive environments.

Ruthenium sputtering targets are used for depositing Ru thin film, which is a important intermediate film in the structure of perpendicular magnetic recording multi-layer films. In the magnetic recording medium, it mainly plays a role in reducing the lattice mismatch stress between the upper and lower layers, increasing thermal stability and reducing noise.

In electronic device applications, ruthenium targets can be used for thin film deposition of electronic devices. Ruthenium thin films have excellent conductivity and corrosion resistance and are suitable for the manufacture of electronic devices in high temperature, high pressure, and corrosive environments. In addition, in optical applications, ruthenium targets can be used to prepare optical thin films and optical coatings. Ruthenium thin films have good reflection and corrosion resistance and are in demand in lasers, optical instruments, and other fields.

Pure ruthenium target: used for semiconductor electrodes, diffusion barriers

Alloy targets:

Ru-Ta (ultra-high density storage material)

Ru-Co (magnetic recording medium)

Compound targets:

Ruthenium oxide (RuO₂, supercapacitor electrode)

Ruthenium nitride (RuN, hard coating)

(1) Semiconductor devices
Copper interconnect diffusion barrier:

Replacement of traditional Ta/TaN

Reduce interface resistance

DRAM capacitor electrode:

Increase charge storage density

(2) Data storage
Hard disk dielectric layer:

Ru bottom layer improves magnetic recording performance

Phase change memory:

As heating electrode material

(3) Electrochemistry
Water electrolysis catalyst:

High oxygen evolution reaction (OER) activity

Supercapacitor:

RuO₂ thin film electrode

(4) Other applications
Medical implant coating

High temperature anti-oxidation coating

Purity ≥99.99% is preferred for semiconductor applications

Ru-Ta alloy can be considered for hard coatings

RuO₂ targets are recommended for catalytic applications

Note: Specific process parameters need to be optimized according to actual equipment conditions.

FAQ 

Are you a factory or manufacturer?
A: Yes, we are a factory but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.

What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.

Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process and we obtain raw material directly from its source.

Do you do spot quality inspection or full inspection?
A: 100% full inspection for sure. All unqualified products are discarded.

How do you ensure your lead time?
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.

What is the MOQ of tungten target ?
A: Depends on quantity, generally, no MOQ limit.

How to pay for it?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time?
A: around 7-20 days which depends on the quantity and production.

What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo

What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.

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