Products Description
Cobalt target is an important sputtering target with unique properties and applications. Cobalt target is widely used in the production of magnetic storage media and as a transition layer in battery manufacturing. The purity, magnetic properties, uniformity and other characteristics of cobalt target are crucial to sputtering performance and film uniformity, especially in 7~5 nm advanced processes. In addition, high-purity cobalt target also has the characteristics of extremely low impurity content, high melting point and high strength.
As a strategic transition metal, cobalt has a key position in data storage, new energy and hard coatings due to its unique magnetic properties and catalytic activity.
Cobalt with a purity of 99.9-99.999% has been widely used in the manufacture of magnetic materials and superalloys, and cobalt sputtering targets with 99.999% or higher purity are applied for advanced electronic components.
Cobalt (Co) Specifications
|
Material Type |
Cobalt |
|
Symbol |
Co |
|
Atomic Weight |
58.933195 |
|
Atomic Number |
27 |
|
Color/Appearance |
Lustrous, Metallic, Grayish Tinge |
|
Thermal Conductivity |
100 W/m.K |
|
Melting Point (°C) |
1,495 |
|
Coefficient of Thermal Expansion |
13.0 x 10-6/K |
|
Theoretical Density (g/cc) |
8.9 |
|
Ferromagnetic |
Magnetic Material |
|
Z Ratio |
0.343 |
|
Sputter |
DC |
|
Max Power Density |
80* |
|
Comments |
Alloys with W/Ta/Mo. |
High-end application areas of Cobalt sputtering target
(1) Data storage technology
Hard disk media: CoCrPt-SiO₂ granular film (magnetic recording density>2Tb/in²)
MRAM memory: CoFeB/MgO tunnel junction (tunneling magnetoresistance>300%)
(2) New energy devices
Lithium battery negative electrode: Co₃O₄ nanotube array (capacity>1000mAh/g)
Water electrolysis catalyst: Co-P/NF film (TOF>0.1s⁻¹)
(3) Hard coating
Cutting tools: Co-WC/DLC nano multilayer (hardness>40GPa)
Aerospace parts: CoCrAlY high temperature oxidation resistant coating (1100°C/1000h)
(4) Biomedicine
Drug carrier: CoFe₂O₄ magnetic nanoparticles (targeted controlled release)
Orthopedic implants: Co-Cr-Mo porous coating (porosity>60%)
Related Sputtering Materials
CoCr sputtering target
CoCrNi sputtering target
CoFeB sputtering target
CoCu sputtering target
CoFe sputtering target
Are you a factory or manufacturer?
A: Yes, we are a factory but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.
What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.
Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process. We obtain our raw material directly from its source.
Do you do spot quality inspection or full inspection?
A: 100% full inspection. Inspectors will check the finished product individually, to ensure they adhere to all parameters. All unqualified products are discarded.
How do you ensure your lead time?
A: From material preparation to machining, and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.
What is the MOQ ?
A: Depends on quantity, generally, no MOQ limit.
How to pay for it?
A: A bank transfer (T/T) will be acceptable.
What is the delivery time?
A: around 7-20 days which depends on the quantity and production.
What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo
What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.
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