Pure Iron Sputtering Target

Our iron sputtering targets are made of high purity iron metal, with a silvery white color, hard and ductile. Pure iron sputtering targets' melting point is 1,535°C, density is 7.87g/cm³ and boiling point is 3000°C with strong ferromagnetism, and good plasticity and thermal conductivity.

Iron sputtering targets can be evaporated under vacuum and used as coatings in the production of semiconductors, magnetic storage media and fuel cells. So, high-purity iron( Fe) sputtering target is an important material for making magnetic recording media, magnetic recording write heads, optoelectronic devices and magnetic sensors.

Also, when it alloyed with carbon, steel is created which is an essential component for building construction and automobile manufacturing.

The shapes of iron targets include flat targets, rotating targets and special-shaped customizations, with purities of 99.9%, 99.95% and 99.99%.

The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the enduser can benefit from constant erosion rates and homogeneous layers.

Pure iron target: used for magnetic thin films, electronic devices or basic research.

Alloy target: such as Fe-Co, Fe-Ni (Permalloy), Fe-Si, etc., used to adjust magnetic or mechanical properties.

Compound target: such as iron oxide (Fe₂O₃), iron nitride (FeN), used for sensors or catalytic coatings.

Vacuum melting: High-purity iron raw materials are purified by arc melting or electron beam melting.

Rolling and annealing: annealing after hot rolling/cold rolling to eliminate internal stress.

Machining: precision turning and polishing to the required size (common thickness 3-10mm, diameter 1-8 inches).

Binding: often combined with copper or molybdenum backing plate to improve heat dissipation (iron has poor thermal conductivity).

Magnetic film: hard disk drive (HDD) head, magnetic sensor (such as GMR/TMR device).

Semiconductors and displays: electrode materials, conductive layers of thin-film transistors (TFTs).

Anti-corrosion coatings: pure iron films are used for basic corrosion research or special protection.

Scientific research uses: spin electronics, metamaterial research, etc.

FeNi sputtering target

FeCo sputtering target

FeCoV sputtering target

FeCrNi sputtering target

Fe2O3 sputtering target

FeSi sputtering target

FAQ

Are you a factory or manufacturer?
A: Yes, we have a factory but we generally use our trading company to handle the business abroad. It will be convenient to receive the remittance and arrange the shipment.

What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.

Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process. We obtain our raw material directly from its source.

Do you do spot quality inspection or full inspection?
A: 100% full inspection. Inspectors will check the finished product individually, to ensure they adhere to all parameters. All unqualified products are discarded.

How do you ensure your lead time?
A: We have an efficient Order Management System, from material preparation to machining, and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.

What is the MOQ of iron Sputtering Target ?
A: Depends on quantity, generally, no MOQ limit.

How to pay for it?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time?
A: around 7-20 days which depends on the quantity and production.

What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo

What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.

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