Products Description
Nickel-iron alloy target is a nickel-iron alloy target with a nickel content of 20%-60%. The melting point of nickel-iron is 1430-1480 degrees and the density is between 8.1-8.7g/cm3. Nickel-iron alloy targets is a low-frequency soft magnetic material with high magnetic permeability and low coercivity in a weak magnetic field.
Nickel-iron (NiFe) alloy targets are used primarily for thin film applications in physical vapor deposition (PVD) processes. Nickel-iron (NiFe) allo combines the excellent electrical conductivity of nickel with the ferromagnetic properties of iron, making it ideal for a variety of electronic and magnetic devices. Our NiFe alloy targets are widely used in semiconductor manufacturing, magnetic materials, and high-frequency devices to improve device performance and stability.
The main raw material of the nickel-iron NiFe sputtering target produced by us is high-purity nickel and iron, melted under vacuum furnace. The purity can reach more than 3N5. If customers have special requirements, we can also mass produce high-purity nickel-iron target with purity of 4N.
Specification of Nickel Iron (NiFe) Sputtering Target
| Type | NiFe Alloy |
| Shape | Rotary, Planar, Plate, Circle, Pellets |
| Material | Nickel + Iron |
| Chemical | Ni + Fe |
| Product Name | Metal Nickel Iron Alloy Target |
| Purity | 99.9-99.95% |
| Size | As Request |
| MOQ | 1PC |
| Appearance | Polished Surface |
| Ratio | NiFe20, NiFe10, NiFe30, NiFe40 |
| Usage | PVD Film Coating |
| Delivery Time | 7-21 Days |
| Keywords | NiFe alloy planar target |
| Package | Carton or Wooden case |

Main application of Nickel Iron (NiFe) Sputtering Target
(1) Magnetoelectronic devices
Magnetic sensors:
Anisotropic magnetoresistance (AMR) elements
Sensitivity >2mV/V·Oe
Magnetic recording heads:
High Ms materials for write heads (Ni₅₀Fe₅₀)
Soft magnetic materials for read heads (Ni₈₁Fe₁₉)
(2) Power electronics
High frequency transformers:
Power loss <300mW/cm³ (1MHz)
Layer thickness 0.5-2μm
Noise suppression:
Electromagnetic shielding effectiveness >60dB (1GHz)
(3) Emerging fields
Spintronic devices (STT-MRAM)
Biomagnetic sensors (magnetocardiography)
Process technology of Nickel Iron (NiFe) Sputtering Target
Raw material processing:
Electrolytic nickel (4N8) + carbonyl iron powder (4N5) vacuum melting
Argon protection casting (oxygen content <20ppm)
Thermomechanical processing:
Hot isostatic pressing (HIP, 1150℃/150MPa/4h)
Multi-directional hot rolling (total deformation rate ≥85%)
Controlled cooling (50-100℃/min)
Precision machining:
Wire cutting (tolerance ±0.02mm)
Chemical mechanical polishing (Ra≤0.03μm)
FAQ
Are you a factory or manufacturer?
A: Yes, we are a factory but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.
What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.
Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process and we obtain raw material directly from its source.
Do you do spot quality inspection or full inspection?
A: 100% full inspection for sure. All unqualified products are discarded.
How do you ensure your lead time?
A: From material preparation to machining and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.
What is the MOQ of Nickel Iron (NiFe) Sputtering Target ?
A: Depends on quantity, generally, no MOQ limit.
How to pay for it?
A: A bank transfer (T/T) will be acceptable.
What is the delivery time?
A: around 7-20 days which depends on the quantity and production.
What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo
What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.
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