Cerium Sputtering Target

Cerium is a soft, ductile, silvery-white metallic chemical element with the symbol Ce and atomic number 58. Cerium sputtering targets play an important role in thin film deposition technology, especially in the fields of semiconductors, display technology, optical coatings, etc.

In the rapid development of thin film deposition technology, cerium oxide (CeO₂) targets have become important materials due to their unique physical and chemical properties. As an important component in the fields of semiconductors, display technology, optical coatings, etc., the performance of cerium oxide targets directly affects the uniformity, stability and functional characteristics of thin films.

1. Purity selection

Semiconductor applications: It is recommended to select 5N (99.999%) high-purity targets to reduce the impact of impurities on device performance
Optical coating: 4N (99.99%) purity can meet the needs, taking into account both cost and performance
2. Size and binding

Magnetic control sputtering equipment: Prefer circular targets (2-6 inches in diameter) to match the equipment cavity structure
High power applications: Must be bound to a copper back target with a thickness of ≥0.2mm to enhance thermal conductivity
3. Sputtering parameter matching

Power density: It is recommended to control it at 2-3W/cm² to avoid overheating of the target or too low a sputtering rate
Atmosphere control: Argon purity ≥99.999% to reduce impurity contamination

1) Catalysis and environmental protection

Automobile exhaust treatment: CeO₂-ZrO₂ nanofilm (OSC>500μmol/g)

Photocatalysis: Ce-TiO₂ composite film (degradation efficiency>95%)

(2) Optical coating

Ultraviolet cutoff filter: CeO₂/SiO₂ multilayer film (250-400nm cutoff)

Radiation protection mirror: CeO₂-PbO glass coating (X-ray absorption (collect)

(3) New energy devices

SOFC electrolyte: Ce₀.₈Sm₀.₂O₂₋δ film (power density>1W/cm²)

Lithium battery positive electrode: CeF₃ coating (cycle life increased by 3 times)

(4) Electronic materials

High-k gate dielectric: CeO₂ film (ε~26, E_g=3.2eV)

Resistive random access memory: CeOx-based devices (switching ratio>10⁶)

CeGd sputtering target

CeO2 sputtering target

CeO2:Gd2O3 sputtering target

Are you a factory or manufacturer?
A: Yes, we are a factory but we generally use our trading company to handle the business abroad. It will be more convenient to receive the remittance and arrange the shipment.

What is the delivery method?
A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.

Why is your product so cost-effective?
A: We cut out the middlemen in the end-to-end manufacturing process. We obtain our raw material directly from its source.

Do you do spot quality inspection or full inspection?
A: 100% full inspection. Inspectors will check the finished product individually, to ensure they adhere to all parameters. All unqualified products are discarded.

How do you ensure your lead time?
A: From material preparation to machining, and finally to a full inspection. Every stage of production is strictly monitored and controlled to give you an accurate delivery time.

What is the MOQ?
A: Depends on quantity, generally, no MOQ limit.

How to pay for it?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time?
A: around 7-20 days which depends on the quantity and production.

What is kind of the package?
A: Generally, we use a carton case or plywood case with protective material inside to ensure the save of cargo

What is the lead time?
A: from order placed to cargo receiving will take around 10-25 days.

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