Characteristics of Fe-Ni-Mo-W Targets
Purity: 3N
Shapes: Planar targets; custom-shaped targets
Dimensions: Machined according to drawings or custom-made
Preparation Method for Iron-Nickel-Molybdenum-Tungsten Alloy Targets
Raw Material Preparation and Powder Mixing: Select high-purity metal powders (iron, nickel, molybdenum, tungsten, etc.), weigh them precisely according to the target alloy composition, and mix them thoroughly.
Forming: Load the mixed powder into a flexible mold and apply high pressure (e.g., 150–200 MPa) at room temperature to compact and bond the powder particles into a green body with sufficient strength.
Hot Pressing: Subject the green body to high-temperature and high-pressure treatment under a vacuum or inert gas atmosphere. This activates internal diffusion and creep, eliminates porosity, significantly increases material density, and results in a fine, uniform grain structure.
Extrusion and Annealing: Extrude the densified billet to achieve the desired shape, followed by annealing to relieve internal stresses and improve plasticity and toughness.
Machining and Backing Plate Welding: Process the target to precise dimensions using methods such as wire-cut EDM and milling.
Applications of Fe-Ni-Mo-W Alloy Targets
Electronics and Semiconductors: Used in integrated circuit manufacturing for thin-film deposition and the creation of magnetic thin films for resistors and magnetic storage devices; these serve functions such as conductive and diffusion barriers, thereby enhancing chip performance and reliability.
Flat-Panel Displays: Serving as key consumables for Thin-Film Transistor Liquid Crystal Display (TFT-LCD) and Active-Matrix Organic Light-Emitting Diode (AMOLED) panels, they are used to fabricate conductive layers and electrode components.
Surface Coatings and Corrosion Protection: Utilized in physical vapor deposition (PVD) processes-such as magnetron sputtering-to apply wear-resistant and corrosion-resistant functional coatings to workpiece surfaces, extending equipment service life in harsh environments.
