Sputtering targets of nickel-cobalt-iron alloys contain specific proportions of nickel (Ni), cobalt (Co), and iron (Fe). These alloys are made into planar or rotating sputtering targets and used in the semiconductor, photovoltaic, precision optics, and functional coatings industries. The preparation of these alloys is specific and requires attention to detail in order to achieve uniform chemical composition, solid-state density, uniform granulation, and quality of the surfaces.
Preparation Method Of Nickel-Cobalt-Iron Alloy Sputtering Targets
Raw material melting: The nickel, cobalt, and iron blocks of high purity are proportioned and placed into the vacuum induction melting furnace. The materials are heated under a vacuum until they are all completely molten and stirred in order to prevent composition segregation.
Casting and forming: A molten nickel cobalt iron alloy is poured into a graphite mold and is quenched in order to obtain an alloying billet and prevent the formation of coarse grains.
Forging and rolling: The alloys are subjected to high-temperature forging and hot rolling processes to break down the casting structure.
Machining and bonding: The nickel-cobalt-iron alloy material is saw-cut to shape and synthesized.
Uses of Nickel-Cobalt-Iron Alloy Sputtering Targets
Integrated Circuits, where it is used for Cu diffusion barrier layers, Ta/CoFe bilayer electrodes, and magnetic tunnel junctions (MTJs) free layers.
Thin-Film Solar Cells, where it serves as a back electrode or buffer layer to enhance ohmic contact and weather durability.
MEMS and Sensors where it is used in the manufacturing of low-loss inductors, magnetic shielding layers, and micro-magnetic actuators.
Surface Functional Coatings where it is used as a wear-resistant, corrosion-resistant, and decorative coating for automotive parts, aerospace fasteners, and biomedical implants.
