Tungsten-titanium alloy is a material alloyed from the transition metals tungsten and titanium. It has even higher density and purity, better resistance to corrosion, and lower volume expansion, which effectively reduces particle formation during manufacture, making the fabrication of quality thin films successful.
Tungsten-Titanium alloy targets are produced using powder metallurgy technology and are widely used in semiconductors and thin-film solar cells. In semiconductor applications, 10wt% WTi thin films serve as diffusion barriers and adhesion layers to separate metallization layers from semiconductors, for example, separating aluminum from silicon or copper from silicon. This significantly improves the functionality of semiconductors in microchips. In thin-film solar cells, 10wt% WTi films also serve as a barrier layer to prevent iron atoms from the steel substrate from diffusing into the molybdenum back contact and CIGS semiconductors. Tungsten-Titanium alloy targets are also used in LEDs and tool coatings.
The primary reason for choosing tungsten-Titanium alloy targets as diffusion barriers and bonding layers in new semiconductor chips is the alloy's excellent surface adhesion and heat dissipation, resulting in products with higher overall performance.
Preparation Method for Tungsten-Titanium Target
1. Take a certain amount of tungsten powder and titanium powder and mix them evenly under an inert atmosphere.
2. Use a mechanical press or cold isostatic press to press the resulting mixture into a billet.
3. Place the resulting billet in a vacuum sintering furnace for densification and sintering.
4. After cooling the tungsten-titanium material sintered in step 3, melt it in a non-consumable vacuum arc furnace to obtain the product.
Advantages of Tungsten-Titanium Target
1. Simple production process and easy operation.
2. Utilizing a tungsten-titanium powder mixture, followed by pressing, sintering, and arc melting, this process effectively addresses the low efficiency, material uniformity, and impurity content challenges of traditional tungsten-titanium alloy preparation.
Our factory can produce WTi 90/10wt% and WTi 85/15wt% targets, and can also customize targets with special compositions. The actual target density is >99% and the average grain size is <100μm. With purity up to 4N5 and special annealing treatment, uniform grain size and low gas content, end users can obtain constant etching rates as well as high-purity and uniform thin film coatings during the PVD process.
