Titanium Silicon Alloy Sputter Round Target

Titanium Silicon Alloy Sputter Round Target

As an essential material for the sputtering process (coating process), metal sputtering targets are generally made of materials with high mechanical properties and high durability.

Titanium Silicon Alloy Sputter Round Target contains all the excellent properties of silicon and titanium, such as high hardness and strength, stable chemical properties, strong high temperature resistance, good ablation resistance, strong thermal shock resistance, good wear resistance, long service life, High human affinity, good surface finish and fine and stable grain structure.

Coatings sputtered by Titanium Silicon Alloy Sputter Round Target can protect tools and components used in high-corrosion, high-cutting and extremely high-temperature environments, and are very suitable for applications in metal smelting, fire protection, high-temperature industries, aerospace, Construction, electronic engineering, magnetron sputtering process and glass coating industry and other fields.

Specification of Titanium Silicon Alloy Sputter Round Target

FAQ:

What is the MOQ?

A: Depends on quantity, generally, no MOQ limit.

How to pay for it?

A: A bank transfer (T/T) will be acceptable.

What is the delivery time?

A: around 7-20 days which depends on the quantity and production.

What is the package?

A: cartoon case or plywood case.

What is the lead time?

A: from order placed to cargo receiving will take around 10-25 days.

What is the delivery method?

A: Generally, we send cargo by UPS, DHL or FedEx. Also, we can send by sea to seaport or by air to the closest airport.

Picture of Titanium Silicon Alloy Sputter Round Target

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