Titanium Chromium Alloy Sputter Target

Titanium Chromium Alloy Sputter Target is very suitable for decorative coating process, such as electronic product display coating, glass coating, hardware tool coating (knife or mold) and microelectronic coating, etc. The sputtered film can prevent various product surfaces rust and aging, in order to prolong the service life and surface ornamental.

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Description of Titanium Chromium Alloy Sputter Target

Titanium-chromium alloy, also known as titanium-aluminum-chromium alloy, is a β-type titanium alloy. The higher the chromium content, the higher the impact resistance and corrosion resistance of the alloy, and the addition of metal molybdenum can also improve the thermal stability of the alloy. strength and long-lasting strength.

Titanium Chromium Alloy Sputter Target is usually manufactured by the powder metallurgy process and the forging smelting process. It is an important metal coating material, surgical implant material, and vacuum coating material.

Titanium Chromium Alloy Sputter Target combines a series of excellent properties of titanium and chromium, such as strong wear resistance, non-magnetic, high strength and hardness, long service life, high work efficiency, and high coating quality etc. It is a very commonly used alloy target .

Titanium Chromium Alloy Sputter Target is very suitable for decorative coating processes, such as electronic product display coating, glass coating, hardware tool coating (knife or mold), and microelectronic coating, etc. The sputtered film can prevent various product surfaces rust and aging, in order to prolong the service life and surface ornamental.

Features of Titanium Chromium Alloy Sputter Target

1. Excellent Film Properties
High Hardness: TiCr films can achieve a hardness of HV 1500-2500 (e.g., TiCrN coatings), and exhibit superior wear resistance compared to pure Cr or TiN.

Corrosion Resistance: Cr forms a dense Cr₂O₃ passivation film that is resistant to salt spray, acids, alkalis, and high-temperature oxidation (below 800°C).

Adjustable Conductivity: By adjusting the Ti/Cr ratio, the film resistivity can be adjusted from 10⁻⁶ to 10⁻³ Ω·cm.

2. High Sputtering Efficiency and Film Quality
Fast Sputtering Rate: TiCr alloy targets have high ionization efficiency in Ar plasma, resulting in a deposition rate superior to pure metal targets.

Dense Films: Low porosity and strong adhesion (e.g., adhesion to steel substrates >70 N).

3. Flexible and Adjustable Composition
Low Cr Content (10-30% Cr): Corrosion resistance similar to that of Ti is achieved, suitable for biomedical or marine environments.

High Cr content (50-70% Cr): Enhances hardness and wear resistance, suitable for tool coating.

Specification of Titanium Chromium Alloy Sputter Target

Grade	TB2,TB3,TB5
Technique	Forging, Flattening, Sintering, Annealing, Rolling, HIP, Machining, Bonding
Purity	99.9%, 99.95%, 99.99%, 99.995%
Width	Customized
Length	Customized
Thickness	Customized
Density	4.5g/cm3,7.2g/cm3
Surface	Polished, Bright, Chemical Cleaning, Black Oxide, etc.
Shape	Rectangular, Square, Column Targets, Tubing Targets, or Customised
Standard	ASTM B777, GB, JIS

Testing and Quality Control of Titanium Chromium Alloy Sputter Target

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FAQ for Titanium Chromium Alloy Sputter Target

What is the MOQ?
A: Depends on quantity, generally, no MOQ limit.

How to pay for it?
A: A bank transfer (T/T) will be acceptable.

What is the delivery time?
A: around 7-20 days, which depends on the quantity and production.

What is the package?
A: cartoon case or plywood case.

What is the lead time?
A: From the order placed to cargo receiving will take around 10-25 days.

What is the delivery method?
A: Generally, we send cargo by UPS, DHL, or FedEx. Also, we can send by sea to a seaport or by air to the closest airport.

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