Pure Ti Sputtering Target
Pure Ti Sputtering Target

Pure Ti Sputtering Target

Pure Ti Sputtering Target has high purity, good surface polish, good electrical and thermal conductivity, good impact resistance, good wear and corrosion resistance, high tensile strength, good ductility.
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Pure Ti Sputtering Target

 

Compared with other targets, metal targets are in higher market demand than ceramic targets, their performance is higher, and the service life is longer. For the sputtering target, the higher the chemical purity of the metal, the better the conductivity and wear resistance of the film made from it.

 

Pure Ti Sputtering Target has high purity, good surface polish, good electrical and thermal conductivity, good impact resistance, good wear and corrosion resistance, high tensile strength, good ductility.

 

Application of Pure Ti Sputtering Target

 

1.Decorative coating materials

 

2. Biological implant materials

 

3. Getter material: Titanium has a strong adsorption capacity for active gases, and can be used in ultra-high vacuum pump systems and sputter ion pumps

 

4. High-tech electronic information materials: the consumption of high-purity titanium for integrated circuits and flat panel displays has increased

 

Specification of Pure Ti Sputtering Target

 

Grade

Grade 1,Grade 2

Technique

Sintering,Forging,Annealing,Rolling,Vacuum Melting,Machining

Purity

99.9%-99.995%

Diameter

<350mm

Thickness

1-100mm

Size for bar

Rectangle (Length 1800mm, Width 400mm Thickness>1mm)

Size for tube

Tube ( Rotory Target, OD:20mm-160mm, Thickness:2-20mm)

Density

4.5g/cm3

Surface

Polished,Bright,Chemical Cleaning,Black Oxide,etc.

Shape

Disc,Plate,Rectangular,Square,Column Targets,

Standard

ASTM B385,GB,JIS

 

Picture of Pure Ti Sputtering Target

 

product-700-700

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