Pure Ti Sputtering Target
Compared with other targets, metal targets are in higher market demand than ceramic targets, their performance is higher, and the service life is longer. For the sputtering target, the higher the chemical purity of the metal, the better the conductivity and wear resistance of the film made from it.
Pure Ti Sputtering Target has high purity, good surface polish, good electrical and thermal conductivity, good impact resistance, good wear and corrosion resistance, high tensile strength, good ductility.
Application of Pure Ti Sputtering Target
1.Decorative coating materials
2. Biological implant materials
3. Getter material: Titanium has a strong adsorption capacity for active gases, and can be used in ultra-high vacuum pump systems and sputter ion pumps
4. High-tech electronic information materials: the consumption of high-purity titanium for integrated circuits and flat panel displays has increased
Specification of Pure Ti Sputtering Target
|
Grade |
Grade 1,Grade 2 |
|
Technique |
Sintering,Forging,Annealing,Rolling,Vacuum Melting,Machining |
|
Purity |
99.9%-99.995% |
|
Diameter |
<350mm |
|
Thickness |
1-100mm |
|
Size for bar |
Rectangle (Length 1800mm, Width 400mm Thickness>1mm) |
|
Size for tube |
Tube ( Rotory Target, OD:20mm-160mm, Thickness:2-20mm) |
|
Density |
4.5g/cm3 |
|
Surface |
Polished,Bright,Chemical Cleaning,Black Oxide,etc. |
|
Shape |
Disc,Plate,Rectangular,Square,Column Targets, |
|
Standard |
ASTM B385,GB,JIS |
Picture of Pure Ti Sputtering Target

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