Description of High Purity Mo Sputtering Target
High-purity Mo Sputtering targets are widely used in research and commercial applications due to their high thermal and electrical conductivity. The use of High Purity Mo Sputter Target is often preferred over other materials due to its superior properties, including high melting point, low vapor pressure, and excellent oxidation resistance.
High-purity Mo Sputtering targets are commonly used in electronics and optoelectronics applications, such as in thin film transistors and solar cells.
High-purity Mo Sputtering Targets are also used in optical and structural components, including mirrors, optical coatings, and thin film sensors. In addition, high-purity Mo Sputter targets are used in medical devices, such as pacemakers, and in industrial applications, such as for coating machine tools to enhance wear resistance.
Preparation Process of High-Purity Mo Sputtering Target
Raw material selection and purification: High-purity molybdenum sputtering targets usually use high-purity molybdenum powder as raw material, which is purified by plasma droplet refining technology or electron beam droplet melting to ensure the high purity of the target.
Forming and sintering: Isostatic pressing, hot isostatic pressing, and sintering are used to ensure the high density and uniform microstructure of the target.
Post-processing: It includes high-power electron beam melting and purification, forging, hot rolling, heat treatment, annealing, and other steps to further improve the purity and performance of the target.
Specification of High Purity Mo Sputtering Target
|
Material |
Pure Mo, TZM Molybdenum alloy, MoLa(Molybdenum-lanthanum) |
|
Technique |
Rolling, Sintering, Vacuum Annealing, Machining |
|
Purity |
≥99.95% |
|
Diameter |
5mm-100mm |
|
Thickness |
0.2mm-12mm |
|
Surface |
Polishing, Grinding |
|
Delivery Time |
About 20 days |
|
Standard |
ASTM B386, GB |
Our Services
Pre-Sales Support
Answer: Tungsten, molybdenum, tantalum, niobium, titanium, nickel, titanium, zirconium, nickel products, professional knowledge, and technical consultation, and tungsten, molybdenum, tantalum, niobium, titanium, nickel, titanium, zirconium, and nickel products. We have professional customer service staff and technical staff to answer any questions for you at any time.
Retail Big Data
Answer: Our principle: punctual delivery, high performance, and thoughtful service. At the same time, we will keep the production process monitoring files for at least 5 years.
After-Sales Support
Answer: After the product is used, we will track the detailed usage of the product, we will provide a full range of industry solutions, and answer any questions at any time.
Key Features and Benefits
Superior Purity: Our Mo sputtering target contains ultra-high purity of 99.95% or greater, and hence yields minimized impurities in deposited films. This high purity further assures higher conductivity and precision, along with optimum adhesion-thus making it the perfect material for semiconductor, photovoltaic, and other high-tech applications where the consistency of the film is of the essence.
High Density and Uniformity: Through the use of advanced powder metallurgy along with sophisticated pressing techniques, each one of our Molybdenum targets is prepared for a high-density contribution with uniform grain structures. The result is uniform sputtering rates that feature low defects; enhanced consistency in thin films is largely a key determinant of the quality of the finished product.
Stability: Our library's physical and chemical characteristics ensure stable sputtering behavior over long production cycles. Such stability directly translates to consistent target utilization rates and a reduction of potential production line downtime, hence contributing to cost efficiency on large-scale procurement operations.
Customization Options: We understand that with each type of industrial facility comes a unique set of needs. That is why our Mo sputtering targets can be manufactured upon request in any given dimensions, shape, and mounting style to suit a wide variety of coating equipment. With this flexibility comes immense compatibility and the ease of integration into the processes already in existence.
Competitive Capabilities - Core
Manufacturing Excellence: With more than 20 years of experience in fabricating high-purity metals, every step of the manufacturing process at MPL involves rigorous quality control-from the selection of raw materials to the finished product inspection. The result is predictably high-quality products that give procurement managers confidence when working with critical applications.
Global Supply Chain Reliability: We pride ourselves on an established global supply network that allows us to efficiently deliver Mo-sputtering targets to international customers. Such successful partnerships in logistics also guarantee timely order arrivals, adding to smoother timelines and reduced operational stress in production.
Technical Expertise and Support: Our expertise in R&D, coupled with our technical support teams, will go a long way in working hand in hand with our customers. Be it recommending specific target configurations or solving particular challenges that may arise during the deposition of films, we have a team available to assistwith your every need throughout the entire procurement journey.
Quality Control Testing Of The Material
|
|
Bulk Buyer Value Proposition
Cost Efficiency Through Consistency: Consistent performance and stability of our Mo sputtering targets directly translate into fewer rejects, larger yields, and a reduced per-unit coating cost. This is keenly important for large volume operations seeking not merely to optimize raw material spend but also uncompromising quality.
Reduced Maintenance Downtime: Our sputtering targets maintain their uniform grain structure and high-density properties, which are associated with fewer problems related to target cracking or uneven erosion. What does that mean for procurement managers? That means they have fewer interruptions in production, ensure uptime, and increase overall production efficiency.
Sustainable Production Practices: We also emphasize sustainability by making sure our process of production process minimizes waste and maintains environmental standards. Our customers will be proud that they source from a responsible partner committed to reducing the environmental impact of high-tech manufacturing.
Why Choose Us
Our High Purity Mo Sputtering Targets are more than just materials, but a commitment to quality, performance, and partnership. That provides products for business and surpasses industry standards with consistent customer-centricity, putting your unique requirements first. In addition to our customer-centric approach, always putting your particular needs at the core of our concerns, we work to establish durable and trustworthy relationships with international bulk buyers who would like to ease their procurement job for advanced coating projects.
Contact Us. If you need a reliable supply of high-quality Mo sputtering targets that assure accuracy, efficiency, and value, we welcome inquiries for more information. Let us provide you with the quality required to take your advanced coating applications to the next level.
Hot Tags: high purity mo sputtering target, China high purity mo sputtering target suppliers, factory, Nickel and Alloys, Cobalt Chrome Alloy Valve Seat, Zr702 Plate, Cobalt Sheet, Zr2 5Nb Alloy Bar, Beryllium Copper Wire
